• Photonics Research
  • Vol. 12, Issue 2, 341 (2024)
Ming Hui Fang1、2、†, Yinong Xie1、†, Fangqi Xue1, Zhilin Wu1, Jun Shi2, Sheng Yu Yang2, Yilin Liu2, Zhihuang Liu2, Hsin Chi Wang2, Fajun Li1, Qing Huo Liu1、3, and Jinfeng Zhu1、*
Author Affiliations
  • 1School of Electronic Science and Engineering, Xiamen University, Xiamen 361005, China
  • 2Quanzhou San’an Integrated Circuit Co., Ltd., Quanzhou 362300, China
  • 3Eastern Institute of Technology, Ningbo 315200, China
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    DOI: 10.1364/PRJ.499795 Cite this Article Set citation alerts
    Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, Jinfeng Zhu. Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices[J]. Photonics Research, 2024, 12(2): 341 Copy Citation Text show less

    Abstract

    Surface acoustic wave (SAW) resonators based on lithium tantalate (LT, LiTaO3) wafers are crucial elements of mobile communication filters. The use of intrinsic LT wafers typically brings about low fabrication accuracy of SAW resonators due to strong UV reflection in the lithography process. This hinders their resonance frequency control seriously in industrial manufacture. LT doping and chemical reduction could be applied to decrease the UV reflection of LT wafers for high lithographic precision. However, conventional methods fail to provide a fast and nondestructive approach to identify the UV performance of standard single-side polished LT wafers for high-precision frequency control. Here, we propose a convenient on-line sensing scheme based on the colorimetry of reduced Fe-doped LT wafers and build up an automatic testing system for industrial applications. The levels of Fe doping and chemical reduction are evaluated by the lightness and color difference of LT-based wafers. The correlation between the wafer visible colorimetry and UV reflection is established to refine the lithography process and specifically manipulate the frequency performance of SAW resonators. Our study provides a powerful tool for the fabrication control of SAW resonators and will inspire more applications on sophisticated devices of mobile communication.
    Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, Jinfeng Zhu. Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices[J]. Photonics Research, 2024, 12(2): 341
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