Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices

Ming Hui Fang; Yinong Xie; Fangqi Xue; Zhilin Wu; Jun Shi; Sheng Yu Yang; Yilin Liu; Zhihuang Liu; Hsin Chi Wang; Fajun Li; Qing Huo Liu; Jinfeng Zhu

doi:10.1364/PRJ.499795

Journals >Photonics Research >Volume 12 >Issue 2 >Page 341 > Article

Photonics Research
Vol. 12, Issue 2, 341 (2024)

Optical colorimetric LiTaO₃ wafers for high-precision lithography on frequency control of SAW devices

Ming Hui Fang^1,2,†, Yinong Xie^1,†, Fangqi Xue¹, Zhilin Wu¹..., Jun Shi², Sheng Yu Yang², Yilin Liu², Zhihuang Liu², Hsin Chi Wang², Fajun Li¹, Qing Huo Liu^1,3 and Jinfeng Zhu^1,*|Show fewer author(s)

Author Affiliations

¹School of Electronic Science and Engineering, Xiamen University, Xiamen 361005, China

²Quanzhou San’an Integrated Circuit Co., Ltd., Quanzhou 362300, China

³Eastern Institute of Technology, Ningbo 315200, China

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DOI: 10.1364/PRJ.499795 Cite this Article Set citation alerts

Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, Jinfeng Zhu, "Optical colorimetric LiTaO₃ wafers for high-precision lithography on frequency control of SAW devices," Photonics Res. 12, 341 (2024) Copy Citation Text

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