Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices

Ming Hui Fang; Yinong Xie; Fangqi Xue; Zhilin Wu; Jun Shi; Sheng Yu Yang; Yilin Liu; Zhihuang Liu; Hsin Chi Wang; Fajun Li; Qing Huo Liu; Jinfeng Zhu

doi:10.1364/PRJ.499795

[1] H. Li, S. A. Tadesse, Q. Liu. Nanophotonic cavity optomechanics with propagating acoustic waves at frequencies up to 12 GHz. Optica, 2, 826-831(2015).

[2] C. C. W. Ruppel. Acoustic wave filter technology–a review. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 64, 1390-1400(2017).

[3] W. Geng, C. Zhao, F. Xue. Influence of structural parameters on performance of SAW resonators based on 128° YX LiNbO₃ single crystal. Nanomaterials, 12, 2109(2022).

[4] J. Streque, J. Camus, T. Laroche. Design and characterization of high-Q SAW resonators based on the AlN/sapphire structure intended for high-temperature wireless sensor applications. IEEE Sens., 20, 6985-6991(2020).

[5] J. Wu, S. Zhang, Y. Chen. Advanced surface acoustic wave resonators on LiTaO₃/SiO₂/sapphire substrate. IEEE Electron Device Lett., 43, 1748-1751(2022).

[6] L. Zhang, S. Zhang, J. Wu. High-performance acoustic wave devices on LiTaO₃/SiC hetero-substrates. IEEE Trans. Microw. Theory Tech., 71, 4182-4192(2023).

[7] S. B. Zhang, J. B. Wu, L. P. Zhang. Recent advances of radio frequency acoustic wave filters based on piezoelectric heterogeneous substrates. Navig. Control, 21, 29-39(2022).

[8] J. Tao, Z. Tang, Y. Zou. A phase canceling technique to improve SAW duplexer isolation. Micromachines, 14, 239(2023).

[9] M. Iwaki, M. Ueda, Y. Satoh. High-isolation SAW duplexer with on-chip SAW compensation circuit optimized for isolated multiple frequency bands. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 66, 1927-1934(2019).

[10] K. E. Kolodziej, B. T. Perry, J. S. Herd. In-band full-duplex technology: techniques and systems survey. IEEE Trans. Microw. Theory Tech., 67, 3025-3041(2019).

[11] M. Kadota, Y. Ishii, S. Tanaka. A spurious-free, steep band rejection filter using a LiTaO₃/quartz heteroacoustic layer surface acoustic wave resonator. Jpn. J. Appl. Phys., 59, SKKC11(2020).

[12] S. A. Zhgoon, A. S. Shvetsov, S. A. Sakharov. High-temperature SAW resonator sensors: electrode design specifics. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 65, 657-664(2018).

[13] S. Deshpande, S. Bhand, G. Bacher. Investigation of the effect of metallization ratio and side shift on the interdigitated electrodes performance for biochemical sensing. J. Appl. Electrochem., 51, 893-904(2021).

[14] S. Asakawa, M. Suzuki, S. Kakio. Enhancement of leaky surface acoustic wave harmonics excitation using bonded dissimilar-material structures. Jpn. J. Appl. Phys., 60, SDDC07(2021).

[15] Y. Zhou, Y. Li, Q. Zhang. Influence of polarization on the optimization of dual BARC structures for hyper-numerical aperture ArF immersion lithography. Proc. SPIE, 6724, 67240Y(2007).

[16] L. Bourkea, R. J. Blaikie. Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography. J. Vac. Sci. Technol. B, 32, 06FE03(2014).

[17] T. Yan, F. Zheng, Y. Yu. Formation mechanism of black LiTaO₃ single crystals through chemical reduction. J. Appl. Crystallogr., 44, 158-162(2011).

[18] T. Yan, H. Liu, J. Y. Wang. Influence of chemical reduction on optical and electrical properties of LiTaO₃ crystal. J. Alloys Compd., 497, 412-415(2010).

[19] N. Sidorov, M. Palatnikov, A. Pyatyshev. Raman scattering in a double-doped single crystal LiTaO₃:Cr(0.2):Nd(0.45 wt%). Photonics, 9, 712(2022).

[20] I. S. Steinberg, V. V. Atuchin. Two-photon holographic recording in LiTaO₃:Fe crystals with high intensity nanosecond pulses at 532 nm. Mater. Chem. Phys., 253, 122956(2020).

[21] (2016). https://webstore.iec.ch/publication/26105

[22] C. C. W. Ruppel, L. Reindl, R. Weigel. SAW devices and their wireless communications applications. IEEE Microwave Mag., 3, 65-71(2002).

[23] M. Lozano, Z. Chen, O. Williams. Giant reflection coefficient on Sc_0.26Al_0.74N polycrystalline diamond surface acoustic wave resonators. Phys. Status Solidi A, 216, 1900360(2019).

[24] S. Tseng, R. Wu. Synthesis of Chebyshev/elliptic filters using minimum acoustic wave resonators. IEEE Access, 7, 103456(2019).

[25] R. Lu, M. H. Li, Y. Yang. Accurate extraction of large electromechanical coupling in piezoelectric MEMS resonators. J. Microelectromech. Syst., 28, 209-217(2019).

[26] L. Cai, A. Mahmoud, M. Khan. Acousto-optical modulation of thin film lithium niobate waveguide devices. Photonics Res., 7, 1003-1013(2019).

[27] S. Yang, M. Fang, L. Lu. Lithium tantalate wafer and blacking method therefor. Patent WO(2021).

[28] M. Katzman, D. Munk, M. Priel. Surface acoustic microwave photonic filters in standard silicon-on-insulator. Optica, 8, 697-707(2021).

[29] M. Katzman, M. Priel, I. Shafir. Surface acoustic wave photonic filters with a single narrow radio-frequency passband in standard silicon on insulator. Photonics Res., 10, 1723-1730(2022).

[30] K. Barman, S. C. Ma, J. J. Huang. Modulation of plasmonic relaxation damping by surface phonons. Photonics Res., 10, 1408-1416(2022).

[31] B. Pottier, L. Bellon. Thermo-optical bistability in silicon micro-cantilevers. SciPost Phys., 10, 120(2021).

[32] S. Wu, Z. Wu, H. Qian. High-performance SH-SAW resonator using optimized 30˚ YX-LiNbO₃/SiO₂/Si. Appl. Phys. Lett., 120, 242201(2022).

[33] Y. Zhang, J. Zhou, Y. Xie. Dual-mode hybrid quasi-SAW/BAW resonators with high effective coupling coefficient. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 67, 1916-1921(2020).

[34] Y. Yao, M. Zhuang, J. Chen. Design of 3D SAW filters based on the spectral element method. IEEE Access, 11, 31228-31237(2023).

[35] K. Masato, S. Ietaka, S. Takeharu. Single crystal for piezoelectric substrate, elastic surface wave filter using it, and manufacturing method thereof. Patent(2008).

[36] J. Kushibiki, Y. Ohashi. Determination of the true congruent composition for LiTaO₃ Single crystals using the LFB ultrasonic material characterization system. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 53, 385-392(2006).

[37] L. Bourke, R. Blaikie. Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography. J. Vac. Sci. Technol. B, 32, 06FE03(2014).

[38] Y. Li, Y. Zhou. Optimization of resolution-enhancement technology and dual-layer bottom antireflective coatings in hypernumerical aperture lithography. J. Vac. Sci. Technol. B, 26, 534-540(2008).