Yue Tang, Ziming Ren, Yunchao Li, Xuwen Hu, Yanjun Zhang, Shubin Yan. Fabrication and Study of Micro Alkali-Metal Vapor Cell Applied to Chip Scale Atomic Clock[J]. Laser & Optoelectronics Progress, 2018, 55(4): 040201
- Laser & Optoelectronics Progress
- Vol. 55, Issue 4, 040201 (2018)
Fig. 1. Diagram of ICP etching system
Fig. 1. [in Chinese]
Fig. 2. Deep silicon etching machine. (a) Picture; (b) schematic of inside
Fig. 3. Structures to be etched
Fig. 4. Flow chart of etching process
Fig. 5. Relationship between etching loop number and etching depth
Fig. 6. 3D schematic of silicon pore structure
Fig. 7. Schematic of etching results
Fig. 8. Picture of bonded alkali-metal vapor cell
Fig. 9. Schematic of experimental principle for saturated absorption
Fig. 10. Saturated absorption of micro alkali-metal vapor cell under different temperatures. (a) 50 ℃; (b) 60 ℃; (c) 70 ℃; (d) 80 ℃
Fig. 11. (a) Schematic of D2 line transition in 87Rb atom; (b) saturated absorption curve of MEMS vapor cell at 80 ℃
|
Table 1. Main parameters of deep silicon etching
Set citation alerts for the article
Please enter your email address
© Copyright 2018-2021 | Chinese Laser Press. All Rights Reserved 沪ICP备15018463号-20