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    Journals >Acta Optica Sinica >Volume 38 >Issue 12 >Page 1202001 > Article
    • Acta Optica Sinica
    • Vol. 38, Issue 12, 1202001 (2018)
    Optimization of Atom Flux in Atom Lithography
    Jie Chen**, Jie Liu, Li Zhu, Xiao Deng*, Xinbin Cheng, and Tongbao Li
    Author Affiliations
  • School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    DOI: 10.3788/AOS201838.1202001 Cite this Article Set citation alerts
    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001 Copy Citation Text show less
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    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001
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    Paper Information
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