• Acta Optica Sinica
  • Vol. 38, Issue 12, 1202001 (2018)
Jie Chen**, Jie Liu, Li Zhu, Xiao Deng*, Xinbin Cheng, and Tongbao Li
Author Affiliations
  • School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
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    DOI: 10.3788/AOS201838.1202001 Cite this Article Set citation alerts
    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001 Copy Citation Text show less

    Abstract

    Atom flux is one of the main factors influencing the quality of nano-gratings fabricated by atom lithography. Based on the theoretical model of eruption volume of atomic furnace tube, the atom flux levels for three typical kinds of furnace tubes are compared by the combination of theory and experiment. Moreover, with the best furnace tube configuration, the peak to valley height of the fabricated Cr nano-gratings increases up to 100 nm, which further optimizes the quality of nano-gratings.
    Jie Chen, Jie Liu, Li Zhu, Xiao Deng, Xinbin Cheng, Tongbao Li. Optimization of Atom Flux in Atom Lithography[J]. Acta Optica Sinica, 2018, 38(12): 1202001
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