Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu; Yanqiu Li

doi:10.3788/AOS202040.0522001

[1] Liu Y, Li Y Q. Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration[J]. Optical Engineering, 55, 095108(2016).

[2] Chapman H N, Hudyma R M, Shafer D R et al. -10-26[2019-09-18](1999). https://patents.glgoo.top/patent/US5973826A/en.

[3] Glatzel H, Ashworth D, Bremer M et al. Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5[J]. Proceedings of SPIE, 8679, 867917(2013).

[4] Cao Z. Optical design of high-NA Coaxial objective system for lithography[D]. Beijing: Beijing Institute of Technology, 48-57(2016).

[5] Markus S. -05-26[2019-09-18][P/OL]. Ralf M. Optical subsystem for projection lithography, illumination optical unit for projection lithography: WO2016078818A1.(2016). https://patents.google.com/patent/WO2016078818A1/ar.

[6] Meisels R, Kuchar F. EUV Bragg reflectors with photonic superlattices[J]. Optics Express, 25, 32215-32226(2017).

[7] Shen S H. Graded multilayer coating design for sub 11 nm resolution EUV lithographic projection lens[D]. Beijing: Beijing Institute of Technology, 29-38(2017).

[8] Svechnikov M V, Chkhalo N I, Gusev S A et al. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography[J]. Optics Express, 26, 33718-33731(2018).

[9] van Setten E, Bottiglieri G, McNamara J et al. High NA EUV lithography: next step in EUV imaging[J]. Proceedings of SPIE, 10957, 1095709(2019).

[10] Liu Y. Design of Off-axis extreme ultraviolet lithographic objective[D]. Beijing: Beijing Institute of Technology, 33-34(2016).

[11] Zhang L C. Progress in EUV multilayer coating technologies[J]. Chinese Journal of Optics and Applied Optics, 3, 554-565(2010).

[12] Liang C, Descour M R, Sasian J M et al. Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics[J]. Applied Optics, 40, 129-135(2001).

[13] Duddles N J. Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system[J]. Applied Optics, 37, 3533-3538(1998).

[14] Cao Z, Li Y Q, Liu F. Manufacturable design of 16-22 nm extreme ultraviolet lithographic objective[J]. Acta Optica Sinica, 33, 0922005(2013).

[15] Ren Z G, Li X Y, Ni D W. Compact space optical system design with large relative aperture and field of view[J]. Acta Optica Sinica, 39, 0922001(2019).