Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu; Yanqiu Li

doi:10.3788/AOS202040.0522001

Journals >Acta Optica Sinica >Volume 40 >Issue 5 >Page 0522001 > Article

Acta Optica Sinica
Vol. 40, Issue 5, 0522001 (2020)

Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu and Yanqiu Li^*

Author Affiliations

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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DOI: 10.3788/AOS202040.0522001 Cite this Article Set citation alerts

Mo Liu, Yanqiu Li. Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System[J]. Acta Optica Sinica, 2020, 40(5): 0522001 Copy Citation Text

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Mo Liu, Yanqiu Li. Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System[J]. Acta Optica Sinica, 2020, 40(5): 0522001

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