• Journal of Semiconductors
  • Vol. 40, Issue 2, 022804 (2019)
P. Vigneshwara Raja1 and N. V. L. Narasimha Murty2
Author Affiliations
  • 1Micro-Fabrication and Characterization Lab, School of Electrical Sciences, IIT Bhubaneswar, Odisha-752050, India
  • 2Electrical Engineering, IIT Tirupati, Tirupati, Andhra Pradesh-517506, India
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    DOI: 10.1088/1674-4926/40/2/022804 Cite this Article
    P. Vigneshwara Raja, N. V. L. Narasimha Murty. Thermally annealed gamma irradiated Ni/4H-SiC Schottky barrier diode characteristics[J]. Journal of Semiconductors, 2019, 40(2): 022804 Copy Citation Text show less
    The energy location of the bulk traps (EC – 0.63 eV, EC – 0.89 eV and EC – 1.13 eV) and the interface states (EC – 0.4 eV to EC – 1.04 eV) in the energy band diagram of the Ni/4H-SiC SBDs.
    Fig. 1. The energy location of the bulk traps (EC – 0.63 eV, EC – 0.89 eV and EC – 1.13 eV) and the interface states (EC – 0.4 eV to EC – 1.04 eV) in the energy band diagram of the Ni/4H-SiC SBDs.
    (Color online) Changes in the TSCAP spectrum for gamma irradiated Ni/4H-SiC SBDs at different annealing temperatures from 400 to 600 °C.
    Fig. 2. (Color online) Changes in the TSCAP spectrum for gamma irradiated Ni/4H-SiC SBDs at different annealing temperatures from 400 to 600 °C.
    (Color online) Annealing effects (400–800 °C) on forward current–voltage (IF–VF) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
    Fig. 3. (Color online) Annealing effects (400–800 °C) on forward current–voltage (IFVF) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
    (Color online) Changes in the IF–VF characteristics (in semi-log scale) of gamma irradiated Ni/4H-SiC SBDs before and after the annealing temperature of 400 °C.
    Fig. 4. (Color online) Changes in the IFVF characteristics (in semi-log scale) of gamma irradiated Ni/4H-SiC SBDs before and after the annealing temperature of 400 °C.
    (Color online) The distribution of interface state density (NSS) as a function of EC–ESS calculated from the forward I–V characteristics of annealed (400–700 °C) gamma irradiated Ni/4H-SiC SBDs.
    Fig. 5. (Color online) The distribution of interface state density (NSS) as a function of ECESS calculated from the forward I–V characteristics of annealed (400–700 °C) gamma irradiated Ni/4H-SiC SBDs.
    (Color online) Annealing (400–700 °C) induced changes in the reverse current–voltage (IR–VR) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
    Fig. 6. (Color online) Annealing (400–700 °C) induced changes in the reverse current–voltage (IRVR) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
    (Color online) (1/C2)–V characteristics at 1 MHz of gamma irradiated Ni/4H-SiC SBDs after heat treatments (400–700 °C).
    Fig. 7. (Color online) (1/C2)–V characteristics at 1 MHz of gamma irradiated Ni/4H-SiC SBDs after heat treatments (400–700 °C).
    (Color online) (1/C2)–V characteristics at different signal frequencies (1 kHz–1 MHz) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperatures 400 and 500 °C (shown in inset).
    Fig. 8. (Color online) (1/C2)–V characteristics at different signal frequencies (1 kHz–1 MHz) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperatures 400 and 500 °C (shown in inset).
    Typical C–V characteristics (in diode geometrical capacitance range) obtained at all signal frequencies (1 kHz to 1 MHz) of the gamma irradiated Ni/4H-SiC SBDs for the annealing temperatures ≥ 800 °C.
    Fig. 9. Typical C–V characteristics (in diode geometrical capacitance range) obtained at all signal frequencies (1 kHz to 1 MHz) of the gamma irradiated Ni/4H-SiC SBDs for the annealing temperatures ≥ 800 °C.
    Typical I–V characteristics (−20 to 20 V) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperature of 950 °C.
    Fig. 10. Typical I–V characteristics (−20 to 20 V) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperature of 950 °C.
    Temp. (°C)VF at 1 mA (V) SBH ΦB (eV) Ideality factor (n) Neff (1014 cm−3) NT (1014 cm−3)
    P1P2G420
    $Trap G420 has disappeared from the TSCAP spectrum. #Neff is not obtainable due to the nearly geometrical capacitance. *TSCAP is not measurable.
    Preannealing1.651.2 (SBH1), 1.3 (SBH2)1.33 (n1), 1.9 (n2) 3.8~1.8~1.5~0.38
    4001.71.41.323.16~1.55~1.35~0.18
    5001.761.261.72.72~1.4~1.3$
    6001.91.161.882~1.3~1.2$
    70021.12.24~1***
    8003.751.018#***
    90012.40.9812.6#***
    1000> 200.9416.4#***
    1100> 200.8824#***
    Table 1. Annealing induced changes in the electrical parameters and trap concentrations of the gamma irradiated Ni/4H-SiC SBDs.
    P. Vigneshwara Raja, N. V. L. Narasimha Murty. Thermally annealed gamma irradiated Ni/4H-SiC Schottky barrier diode characteristics[J]. Journal of Semiconductors, 2019, 40(2): 022804
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