P. Vigneshwara Raja1 and N. V. L. Narasimha Murty2
Author Affiliations
1Micro-Fabrication and Characterization Lab, School of Electrical Sciences, IIT Bhubaneswar, Odisha-752050, India2Electrical Engineering, IIT Tirupati, Tirupati, Andhra Pradesh-517506, Indiashow less
Fig. 1. The energy location of the bulk traps (EC – 0.63 eV, EC – 0.89 eV and EC – 1.13 eV) and the interface states (EC – 0.4 eV to EC – 1.04 eV) in the energy band diagram of the Ni/4H-SiC SBDs.
Fig. 2. (Color online) Changes in the TSCAP spectrum for gamma irradiated Ni/4H-SiC SBDs at different annealing temperatures from 400 to 600 °C.
Fig. 3. (Color online) Annealing effects (400–800 °C) on forward current–voltage (IF–VF) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
Fig. 4. (Color online) Changes in the IF–VF characteristics (in semi-log scale) of gamma irradiated Ni/4H-SiC SBDs before and after the annealing temperature of 400 °C.
Fig. 5. (Color online) The distribution of interface state density (NSS) as a function of EC–ESS calculated from the forward I–V characteristics of annealed (400–700 °C) gamma irradiated Ni/4H-SiC SBDs.
Fig. 6. (Color online) Annealing (400–700 °C) induced changes in the reverse current–voltage (IR–VR) characteristics of the gamma irradiated Ni/4H-SiC SBDs.
Fig. 7. (Color online) (1/C2)–V characteristics at 1 MHz of gamma irradiated Ni/4H-SiC SBDs after heat treatments (400–700 °C).
Fig. 8. (Color online) (1/C2)–V characteristics at different signal frequencies (1 kHz–1 MHz) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperatures 400 and 500 °C (shown in inset).
Fig. 9. Typical C–V characteristics (in diode geometrical capacitance range) obtained at all signal frequencies (1 kHz to 1 MHz) of the gamma irradiated Ni/4H-SiC SBDs for the annealing temperatures ≥ 800 °C.
Fig. 10. Typical I–V characteristics (−20 to 20 V) of the gamma irradiated Ni/4H-SiC SBDs at the annealing temperature of 950 °C.
Temp. (°C) | VF at 1 mA (V)
| SBH ΦB (eV)
| Ideality factor (n)
| Neff (1014 cm−3)
| NT (1014 cm−3)
|
---|
P1 | P2 | G420 |
---|
$Trap G420 has disappeared from the TSCAP spectrum. #Neff is not obtainable due to the nearly geometrical capacitance. *TSCAP is not measurable.
| Preannealing | 1.65 | 1.2 (SBH1), 1.3 (SBH2) | 1.33 (n1), 1.9 (n2)
| 3.8 | ~1.8 | ~1.5 | ~0.38 | 400 | 1.7 | 1.4 | 1.32 | 3.16 | ~1.55 | ~1.35 | ~0.18 | 500 | 1.76 | 1.26 | 1.7 | 2.72 | ~1.4 | ~1.3 | $ | 600 | 1.9 | 1.16 | 1.88 | 2 | ~1.3 | ~1.2 | $ | 700 | 2 | 1.1 | 2.24 | ~1 | * | * | * | 800 | 3.75 | 1.01 | 8 | # | * | * | * | 900 | 12.4 | 0.98 | 12.6 | # | * | * | * | 1000 | > 20 | 0.94 | 16.4 | # | * | * | * | 1100 | > 20 | 0.88 | 24 | # | * | * | * |
|
Table 1. Annealing induced changes in the electrical parameters and trap concentrations of the gamma irradiated Ni/4H-SiC SBDs.