• Chinese Optics Letters
  • Vol. 14, Issue 5, 052201 (2016)
An Pan1, Tao Chen1、*, Cunxia Li2, and Xun Hou1
Author Affiliations
  • 1Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Shaanxi Key Lab of Information Photonic Technique, School of Electronics & Information Engineering, Xi’an Jiaotong University, Xi’an 710049, China
  • 2Xi’an University of Technology, Department of Applied Physics, Xi’an 710049, China
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    DOI: 10.3788/COL201614.052201 Cite this Article Set citation alerts
    An Pan, Tao Chen, Cunxia Li, Xun Hou. Parallel fabrication of silicon concave microlens array by femtosecond laser irradiation and mixed acid etching[J]. Chinese Optics Letters, 2016, 14(5): 052201 Copy Citation Text show less

    Abstract

    A method of multi-beam femtosecond laser irradiation combined with modified HF-HNO3-CH3COOH etching is used for the parallel fabrication of all-silicon plano-concave microlens arrays (MLAs). The laser beam is split by a diffractive optical element and focused by a lens to drill microholes parallely on silicon. An HF-HNO3-H2SO4-CH3COOH solution is used to expand and polish laser-ablated microholes to form microlenses. Compared with the HF-HNO3-CH3COOH solution, the solution with H2SO4 can effectively reduce the etched surface roughness. The morphologies of MLAs at different laser powers and pulse numbers are observed. The image array formed by the silicon microlenses is also demonstrated.
    Si(s)+4HNO3(aq)SiO2(s)+4NO2(g)+2H2O(aq),(1)

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    SiO2(s)+6HF(aq)H2SiF6(aq)+2H2O(aq).(2)

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    An Pan, Tao Chen, Cunxia Li, Xun Hou. Parallel fabrication of silicon concave microlens array by femtosecond laser irradiation and mixed acid etching[J]. Chinese Optics Letters, 2016, 14(5): 052201
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