• Journal of Semiconductors
  • Vol. 42, Issue 1, 014103 (2021)
Ye Tao1、3, Xuhong Li1, Zhongqiang Wang1, Gang Li2, Haiyang Xu1, Xiaoning Zhao1, Ya Lin1, and Yichun Liu1
Author Affiliations
  • 1Key Laboratory for UV Light-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun 130024, China
  • 2Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China
  • 3School of Science, Changchun University of Science and Technology, Changchun 130022, China
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    DOI: 10.1088/1674-4926/42/1/014103 Cite this Article
    Ye Tao, Xuhong Li, Zhongqiang Wang, Gang Li, Haiyang Xu, Xiaoning Zhao, Ya Lin, Yichun Liu. Neutron irradiation-induced effects on the reliability performance of electrochemical metallization memory devices[J]. Journal of Semiconductors, 2021, 42(1): 014103 Copy Citation Text show less

    Abstract

    In this work, electrochemical metallization memory (ECM) devices with an Ag/AgInSbTe (AIST)/amorphous carbon (a-C)/Pt structure were irradiated with 14 MeV neutrons. The switching reliability performance before and after neutron irradiation was compared and analyzed in detail. The results show that the irradiated memory cells functioned properly, and the initial resistance, the resistance at the low-resistance state (LRS), the RESET voltage and the data retention performance showed little degradation even when the total neutron fluence was as high as 2.5 × 1011 n/cm2. Other switching characteristics such as the forming voltage, the resistance at the high-resistance state (HRS), and the SET voltage were also studied, all of which merely showed a slight parameter drift. Irradiation-induced Ag ions doping of the a-C layer is proposed to explain the damaging effects of neutron irradiation. The excellent hard characteristics of these Ag/AIST/a-C/Pt-based ECM devices suggest potential beneficial applications in the aerospace and nuclear industries.
    Ye Tao, Xuhong Li, Zhongqiang Wang, Gang Li, Haiyang Xu, Xiaoning Zhao, Ya Lin, Yichun Liu. Neutron irradiation-induced effects on the reliability performance of electrochemical metallization memory devices[J]. Journal of Semiconductors, 2021, 42(1): 014103
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