• Acta Optica Sinica
  • Vol. 43, Issue 13, 1305001 (2023)
Zijiang Yang1、2、3, Qiao Pan1、2、3、*, Jiacheng Zhu1、2、3, and Weimin Shen1、2、3
Author Affiliations
  • 1Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province, Suzhou 215006, Jiangsu, China
  • 2Key Lab of Modern Optical Technologies of Education Ministry of China, Suzhou 215006, Jiangsu, China
  • 3School of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu, China
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    DOI: 10.3788/AOS230446 Cite this Article Set citation alerts
    Zijiang Yang, Qiao Pan, Jiacheng Zhu, Weimin Shen. Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching[J]. Acta Optica Sinica, 2023, 43(13): 1305001 Copy Citation Text show less
    References

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    [11] Yang Z P, Li Z Y, Pu E C et al. High-resolution echelle grating spectrometer based on off-axis three-mirror reflective optical system[J]. Acta Optica Sinica, 41, 2212001(2021).

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    [14] Kendall D L, Shoultz R A. Wet chemical etching of silicon and SiO2, and ten challenges for micromachiners[M]. Handbook of microlithography, micromachining, and microfabrication, volume 2: micromachining and microfabrication, 41-97(2017).

    [15] Liu C. Fabrication of gratings based on the nanoimprint lithography[D], 13-16(2015).

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    [18] Wang Y, Liu Z K, Zheng Y C et al. High-accuracy alignment of the grating pattern along silicon〈112〉directions using a short rectangular array[J]. Journal of Micromechanics and Microengineering, 27, 065008(2017).

    Zijiang Yang, Qiao Pan, Jiacheng Zhu, Weimin Shen. Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching[J]. Acta Optica Sinica, 2023, 43(13): 1305001
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