Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching

Zijiang Yang; Qiao Pan; Jiacheng Zhu; Weimin Shen

doi:10.3788/AOS230446

Journals >Acta Optica Sinica >Volume 43 >Issue 13 >Page 1305001 > Article

Acta Optica Sinica
Vol. 43, Issue 13, 1305001 (2023)

Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching

Zijiang Yang^1、2、3, Qiao Pan^{1、2、3、*}, Jiacheng Zhu^1、2、3, and Weimin Shen^1、2、3

Author Affiliations

¹Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province, Suzhou 215006, Jiangsu, China

²Key Lab of Modern Optical Technologies of Education Ministry of China, Suzhou 215006, Jiangsu, China

³School of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu, China

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DOI: 10.3788/AOS230446 Cite this Article Set citation alerts

Zijiang Yang, Qiao Pan, Jiacheng Zhu, Weimin Shen. Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching[J]. Acta Optica Sinica, 2023, 43(13): 1305001 Copy Citation Text

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Zijiang Yang, Qiao Pan, Jiacheng Zhu, Weimin Shen. Fabrication of Silicon Echelle Grating by Ultraviolet Lithography Combined with Wet Etching[J]. Acta Optica Sinica, 2023, 43(13): 1305001

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