Pulsed laser deposition has broad applications in scientific research and industry as a simple, versatile, and efficient film growth technology. The requirements for film quality are becoming more and more stringent in many high-tech applications. Reducing or eliminating the particulates inside and on the surface of a film has become an urgent problem. This paper introduces the source of particulates in pulsed laser deposition and discusses the advantages and disadvantages associated with various particulate control techniques. Finally, the trend of particulate control based on pulsed laser deposition is discussed.