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Journals >Chinese Optics Letters >Volume 18 >Issue 8 >Page 083101 > Article

Chinese Optics Letters
Vol. 18, Issue 8, 083101 (2020)

Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Liangyi Hang^*, Weiguo Liu^**, and Junqi Xu

Author Affiliations

Shaanxi Provincial Key Laboratory of Thin Films Technology and Optical Test, Xi’an Technological University, Xi’an 710021, China

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DOI: 10.3788/COL202018.083101 Cite this Article Set citation alerts

Liangyi Hang, Weiguo Liu, Junqi Xu. Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition[J]. Chinese Optics Letters, 2020, 18(8): 083101 Copy Citation Text

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Schematic of RF-PECVD coating system used in this study.

Fig. 1. Schematic of RF-PECVD coating system used in this study.

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XRD patterns of SiNx thin films formed by PECVD method on (a) Si and (b) glass and fused silica (FS).

Fig. 2. XRD patterns of

{SiN}_{x}

thin films formed by PECVD method on (a) Si and (b) glass and fused silica (FS).

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Fig. 3. High-resolution XPS spectra of

{SiN}_{x}

films formed on Si, glass (G), and FS substrates: (a) Si 2p spectra; (b) N 1s spectra.

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$Optical constants of SiNx films formed on different substrates: (a) refractive index; (b) extinction coefficient.$

Fig. 4. Optical constants of

{SiN}_{x}

films formed on different substrates: (a) refractive index; (b) extinction coefficient.

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Fig. 5. Deposition rates and physical thicknesses of

{SiN}_{x}

films deposited on various substrates.

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Fig. 6. Transmittances of

{SiN}_{x}

films: (a)

{SiN}_{x 2}

on glass; (b)

{SiN}_{x 3}

on FS.

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Samples	Silicon (%)	Nitrogen (%)	Uncertainty (%)
${SiN}_{x 1}$	48	52	±4
${SiN}_{x 2}$	46	54	±4
${SiN}_{x 3}$	46	54	±4

Table 1. Relative Atomic Concentrations of Si and N of

{SiN}_{x}

Films Deposited on Various Substrates, Obtained by XPS

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No.	Tetrahedron	Bonding Unit	$E_{B}$ ^a (eV) of Si $2 p$
1	$Si - {Si}_{3} N$	${Si}_{3} N$	100.30
2	$Si - {Si}_{2} N_{2}$	${Si}_{3} N_{2}$	101.00
3	$Si - {SiN}_{3}$	SiN	101.70
4	$Si - N_{4}$	${Si}_{3} N_{4}$	102.40

Table 2. Binding Energies of All the Possible Chemical Bonds in Regions Si

2 p

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References (43)

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Liangyi Hang, Weiguo Liu, Junqi Xu. Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition[J]. Chinese Optics Letters, 2020, 18(8): 083101

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