Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Liangyi Hang; Weiguo Liu; Junqi Xu

doi:10.3788/COL202018.083101

Journals >Chinese Optics Letters >Volume 18 >Issue 8 >Page 083101 > Article

Chinese Optics Letters
Vol. 18, Issue 8, 083101 (2020)

Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Liangyi Hang^*, Weiguo Liu^**, and Junqi Xu

Author Affiliations

Shaanxi Provincial Key Laboratory of Thin Films Technology and Optical Test, Xi’an Technological University, Xi’an 710021, China

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DOI: 10.3788/COL202018.083101 Cite this Article Set citation alerts

Liangyi Hang, Weiguo Liu, Junqi Xu. Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition[J]. Chinese Optics Letters, 2020, 18(8): 083101 Copy Citation Text

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