• Chinese Optics Letters
  • Vol. 18, Issue 8, 083101 (2020)
Liangyi Hang*, Weiguo Liu**, and Junqi Xu
Author Affiliations
  • Shaanxi Provincial Key Laboratory of Thin Films Technology and Optical Test, Xi’an Technological University, Xi’an 710021, China
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    DOI: 10.3788/COL202018.083101 Cite this Article Set citation alerts
    Liangyi Hang, Weiguo Liu, Junqi Xu. Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition[J]. Chinese Optics Letters, 2020, 18(8): 083101 Copy Citation Text show less
    References

    [1] B. Karunagaran, S. J. Chung, S. Velumani, E.-K. Suh. Mater. Chem. Phys., 106, 130(2007).

    [2] J. Jaglarz, M. Jurzecka-Szymacha, S. Kluska. Thin Solid Films, 669, 564(2019).

    [3] A. E. T. Kuiper, S. W. Koo, F. H. P. M. Habraken, Y. Tamminga. J. Vac. Sci. Technol. B, 1, 62(1983).

    [4] J. Dupuis, E. Fourmond, J. F. Lelièvre, D. Ballutaud, M. Lemiti. Thin Solid Films, 516, 6954(2008).

    [5] C. Huber, B. Stein, H. Kalt. Thin Solid Films, 634, 66(2017).

    [6] K. Olesko, H. Szymanowski, M. Gazicki-lipman, J. Balcerzak, W. Szymanski, W. Pawlak, A. Sobczyk-guzenda. Mater. Sci. Poland, 36, 56(2018).

    [7] M. D. Barankin, T. S. Williams, E. Gonzalez, R. F. Hicks. Thin Solid Films, 519, 1307(2010).

    [8] M. Abbasi-Firouzjah, B. Shokri. J. Appl. Phys., 114, 214102(2013).

    [9] V. Cech, J. Studynka, B. Cechalova, J. Mistrik, J. Zemek. Surf. Coat. Tech., 202, 5572(2008).

    [10] A. Upadhyaya, M. Sheoran, A. Rohatgi, 1273(2005).

    [11] T. Lauinger, J. Schmidt, A. G. Aberle, R. Hezel. Appl. Phys. Lett., 68, 1232(1996).

    [12] A. del Prado, E. San Andrés, F. L. Martinez, I. Mártil, G. González-Daz, W. Bohne, J. Röhrich, B. Selle, M. Fernández. Vacuum, 67, 507(2002).

    [13] I. Koirala, C. Park, S. Lee, D. Choi. Chin. Opt. Lett., 17, 082301(2019).

    [14] B. Rangarajan, A. Y. Kovalgin, K. Wörhoff, J. Schmitz. Opt. Lett., 38, 941(2013).

    [15] M. F. Ceiler, P. A. Kohl, S. A. Bidstrup. J. Electrochem. Soc., 142, 2067(1995).

    [16] I. Guler. Mater. Sci. Eng. B-Adv., 246, 21(2019).

    [17] J. Xue, L. Hang, H. Liu. Opt. Tech, 40, 353(2014).

    [18] J. Dupuis, E. Fourmond, D. Ballutaud, N. Bererd, M. Lemiti. Thin Solid Films, 519, 1325(2010).

    [19] J. Seiffe, L. Weiss, M. Hofmann, L. Gautero, J. Rentsch(2008).

    [20] P. Li, L. Hang, J. Xu, L. Li. J. Appl. Opt, 36, 206(2015).

    [21] W. Jiang, D. Xu, B. Xiong, Y. Wang. Ceram. Int., 42, 1217(2016).

    [22] L. Hang, W. Liu, L. Hang, S. Zhou. Laser & Optoelectron. Progress, 57, 130003(2020).

    [23] A. Basak, A. Hati, A. Mondal, U. P. Singh, S. K. Taheruddin. Thin Solid Films, 645, 97(2018).

    [24] E. Erdoğan, M. Kundakçı. Microelectron. Eng., 207, 15(2019).

    [25] S. H. Ribut, C. A. C. Abdullah, M. Z. M. Yusoff. Results Phys., 13, 102146(2019).

    [26] T. Jiang, R. Miao, J. Zhao, Z. Xu, T. Zhou, K. Wei, J. You, X. Zheng, Z. Wang, X. Cheng. Chin. Opt. Lett., 17, 020005(2019).

    [27] B. Astinchap, K. G. Laelabadi. J. Phys. Chem. Solids, 129, 217(2019).

    [28] W. A. Lanford, M. J. Rand. J. Appl. Phys., 49, 2473(1978).

    [29] G. Santana, J. Fandino, A. Ortiz, J. C. Alonso. J. Non-Cryst. Solids, 351, 922(2005).

    [30] W. R. Knolle, J. W. Osenbach. J. Appl. Phys., 58, 1248(1985).

    [31] J. Thurn, R. F. Cook, M. Kamarajugadda, S. P. Bozeman, L. C. Stearns. J. Appl. Phys., 95, 967(2004).

    [32] P. Cova, S. Poulin, O. Grenier, R. A. Masut. J. Appl. Phys., 97, 073518(2005).

    [33] P. J. W. Weijs, J. F. van Acker, J. C. Fuggle, P. A. M. van der Heide, H. Haak, K. Horn. Surf. Sci., 260, 102(1992).

    [34] G. M. Ingo, N. Zacchetti, D. della Sala, C. Coluzza. J. Vac. Sci. Tech. A, 7, 3048(1989).

    [35] V. A. Gritsenko, R. W. N. Kowk, H. Wong, J. B. Xu. J. Non-Cryst. Solids, 297, 96(2002).

    [36] S. Naskar, S. D. Wolter, C. A. Bower, B. R. Stoner, J. T. Glass. Appl. Phys. Lett., 87, 261907(2005).

    [37] J. R. Shallenberger, D. A. Cole, S. W. Novak. J. Vac. Sci. Tech. A, 17, 1086(1999).

    [38] N. Jehanathan, Y. Liu, B. Walmsley, J. Dell, M. Saunders. J. Appl. Phys., 100, 123516(2006).

    [39] X. Zhang. Research on anti-reflection coatings by PECVD technology(2010).

    [40] T. Begou, H. Krol, D. Stojcevski, F. Lemarchand, M. Lequime, C. Grezes-Besset, J. Lumeau. CEAS Space J., 9, 441(2017).

    [41] K. Hendrix. Appl. Opt., 56, C201(2017).

    [42] H. Liu, L. Hang, J. Xue. Opt. Instrum., 36, 364(2014).

    [43] H. A. Macleod. Thin-Film Optical Filters(2018).

    Data from CrossRef

    [1] Shuang Gong, Baoxi Yang, Huijie Huang. Correction of thickness uniformity of multilayer fluoride coatings on steep spherical substrates using shadowing mask combinations in planetary rotation systems. Applied Optics, 60, 7581(2021).

    Liangyi Hang, Weiguo Liu, Junqi Xu. Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition[J]. Chinese Optics Letters, 2020, 18(8): 083101
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