• Journal of Semiconductors
  • Vol. 45, Issue 3, 032301 (2024)
Shuyu Wu1、4, Rongrong Cao3, Hao Jiang2、*, Yu Li2, Xumeng Zhang2, Yang Yang1, Yan Wang1, Yingfen Wei2、**, and Qi Liu2
Author Affiliations
  • 1State Key Laboratory of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • 2Frontier institute of Chip and System, Fudan University, Shanghai 200433, China
  • 3College of Electronic Science and Technology, National University of Defense Technology, Changsha 410073, China
  • 4University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.1088/1674-4926/45/3/032301 Cite this Article
    Shuyu Wu, Rongrong Cao, Hao Jiang, Yu Li, Xumeng Zhang, Yang Yang, Yan Wang, Yingfen Wei, Qi Liu. Reliable ferroelectricity down to cryogenic temperature in wake-up free Hf0.5Zr0.5O2 thin films by thermal atomic layer deposition[J]. Journal of Semiconductors, 2024, 45(3): 032301 Copy Citation Text show less
    (Color online) (a) The P−E hysteresis curves of HZO capacitor at its pristine state and after 103 cycles. The inside illustration is a schematic diagram of HZO capacitor devices during electrical measurements. (b) The GI-XRD diffractogram of HZO thin film at an incident angle of 0.5°. (c) A cross-sectional TEM image of the HZO capacitor. (d) The fast Fourier transform pattern from the HR-TEM image in the yellow box in (c).
    Fig. 1. (Color online) (a) The PE hysteresis curves of HZO capacitor at its pristine state and after 103 cycles. The inside illustration is a schematic diagram of HZO capacitor devices during electrical measurements. (b) The GI-XRD diffractogram of HZO thin film at an incident angle of 0.5°. (c) A cross-sectional TEM image of the HZO capacitor. (d) The fast Fourier transform pattern from the HR-TEM image in the yellow box in (c).
    (Color online) (a) The J−E curves of TiN/HZO/TiN capacitor ranging from 300 to 30 K. (b) The fitting results of the leakage current at temperatures from 300 to 130 K by the P−F emission at 300, 200, and 130 K. (c) The fitting plot of the leakage current at 30 K by the F−N tunneling. (d) The typical P−E curves of HZO capacitors at temperatures from 300 to 30 K under 3.0 MV/cm. (e) The statistical results of ±Pr values at temperatures from 300 to 30 K. The inset shows the typical PUND curves at various temperatures under 3.0 MV/cm. (f) εr−E curves of HZO capacitors in the temperature ranging from 300 to 30 K.
    Fig. 2. (Color online) (a) The JE curves of TiN/HZO/TiN capacitor ranging from 300 to 30 K. (b) The fitting results of the leakage current at temperatures from 300 to 130 K by the PF emission at 300, 200, and 130 K. (c) The fitting plot of the leakage current at 30 K by the F−N tunneling. (d) The typical PE curves of HZO capacitors at temperatures from 300 to 30 K under 3.0 MV/cm. (e) The statistical results of ±Pr values at temperatures from 300 to 30 K. The inset shows the typical PUND curves at various temperatures under 3.0 MV/cm. (f) εrE curves of HZO capacitors in the temperature ranging from 300 to 30 K.
    (Color online) The PUND curves of HZO capacitors at different temperatures under (a) 2.5 MV/cm, (b) 2.0 MV/cm, and (c) 1.5 MV/cm. (d) The averaged Ec values at different temperatures. (e) The 2Pr values at different temperatures. (f) The relationship between 2Pr values with temperature in previous reports and this work. The 2Pr values in this work are from PUND data under 3.0 and 2.5 MV/cm. The letter W and P stand for woken-up state and pristine state, respectively. The applied electric fields are indicated on the right.
    Fig. 3. (Color online) The PUND curves of HZO capacitors at different temperatures under (a) 2.5 MV/cm, (b) 2.0 MV/cm, and (c) 1.5 MV/cm. (d) The averaged Ec values at different temperatures. (e) The 2Pr values at different temperatures. (f) The relationship between 2Pr values with temperature in previous reports and this work. The 2Pr values in this work are from PUND data under 3.0 and 2.5 MV/cm. The letter W and P stand for woken-up state and pristine state, respectively. The applied electric fields are indicated on the right.
    (Color online) Endurance characteristics of HZO capacitors under 2.5 MV/cm at 300 and 30 K.
    Fig. 4. (Color online) Endurance characteristics of HZO capacitors under 2.5 MV/cm at 300 and 30 K.
    Shuyu Wu, Rongrong Cao, Hao Jiang, Yu Li, Xumeng Zhang, Yang Yang, Yan Wang, Yingfen Wei, Qi Liu. Reliable ferroelectricity down to cryogenic temperature in wake-up free Hf0.5Zr0.5O2 thin films by thermal atomic layer deposition[J]. Journal of Semiconductors, 2024, 45(3): 032301
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