• Laser & Optoelectronics Progress
  • Vol. 58, Issue 5, 0531001 (2021)
Yonggang Pan1、*, Zheng Liu1, Ben Wang2, Sibao Zhang1, and Lü Chenrui1
Author Affiliations
  • 1Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an , Shaanxi 710119, China
  • 2Shanghai Mifeng Laser Technology Co., Ltd., Shanghai 200120, China
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    DOI: 10.3788/LOP202158.0531001 Cite this Article Set citation alerts
    Yonggang Pan, Zheng Liu, Ben Wang, Sibao Zhang, Lü Chenrui. Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System[J]. Laser & Optoelectronics Progress, 2021, 58(5): 0531001 Copy Citation Text show less
    References

    [1] Liu C D. Spectrum uniformity optimization of 193 nm AR coatings on spherical substrates(2019).

    [2] Fu X H, Zhao D, Lu C et al. Uniformity of film thickness distribution for single evaporation source. Acta Optica Sinica, 39, 1231001(2019).

    [3] Tang J F, Gu P F, Liu X. Modern optical thin film technology(2006).

    [4] Dong L, Zhao Y A, Yi K et al. Influence of different kinds of evaporation sources on films uniformity. High Power Laser & Particle Beams, 17, 1518-1522(2005).

    [5] Kotlikov E N, Prokashev V N, Ivanov V A et al. Thickness uniformity of films deposited on rotating substrates. Journal of Optical Technology, 76, 100-103(2009).

    [6] Sassolas B, Flaminio R, Franc J et al. Masking technique for coating thickness control on large and strongly curved aspherical optics. Applied Optics, 48, 3760-3765(2009).

    [7] Villa F, Martínez A, Regalado L E. Correction masks for thickness uniformity in large-area thin films. Applied Optics, 39, 1602-1610(2000).

    [8] Zhang L C, Gao J S. Design of uniformity correction masks based on shadow matrix. Optics and Precision Engineering, 21, 2757-2763(2013).

    [9] Holland L. Vacuum deposition of thin films(1956).

    [10] Tang W Z. Preparation principle technology and application of thin film material. 2nd ed(2003).

    [11] Wang B, Fu X H, Song S G et al. Simulation and optimization of film thickness uniformity in physical vapor deposition. Coatings, 8, 325(2018).

    [12] Wang N, Shao J D, Yi K et al. Impact of evaporation characteristics of SiO2 on uniformity of thin-film thickness. Chinese Journal of Lasers, 37, 2051-2056(2010).

    Yonggang Pan, Zheng Liu, Ben Wang, Sibao Zhang, Lü Chenrui. Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System[J]. Laser & Optoelectronics Progress, 2021, 58(5): 0531001
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