Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System

Yonggang Pan; Zheng Liu; Ben Wang; Sibao Zhang; Lü Chenrui

doi:10.3788/LOP202158.0531001

Journals >Laser & Optoelectronics Progress >Volume 58 >Issue 5 >Page 0531001 > Article

Laser & Optoelectronics Progress
Vol. 58, Issue 5, 0531001 (2021)

Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System

Yonggang Pan^1、*, Zheng Liu¹, Ben Wang², Sibao Zhang¹, and Lü Chenrui¹

Author Affiliations

¹Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an , Shaanxi 710119, China

²Shanghai Mifeng Laser Technology Co., Ltd., Shanghai 200120, China

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DOI: 10.3788/LOP202158.0531001 Cite this Article Set citation alerts

Yonggang Pan, Zheng Liu, Ben Wang, Sibao Zhang, Lü Chenrui. Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System[J]. Laser & Optoelectronics Progress, 2021, 58(5): 0531001 Copy Citation Text

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