• Journal of Semiconductors
  • Vol. 41, Issue 10, 102404 (2020)
Hao Zhang1, Qiangsheng Cui2, Xu Yan1,3, Jiahui Shi1, and Fujiang Lin1
Author Affiliations
  • 1Micro-/Nano-Electronic System Integration R&D Center (MESIC), University of Science and Technology of China (USTC), Hefei 230026, China
  • 2Hengxin Semitech Co., Ltd., Suzhou 215123, China
  • 3Department of Electrical and Computer Engineering (ECE), National University of Singapore (NUS), Singapore 117583, Singapore
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    DOI: 10.1088/1674-4926/41/10/102404 Cite this Article
    Hao Zhang, Qiangsheng Cui, Xu Yan, Jiahui Shi, Fujiang Lin. A 0.5–3.0 GHz SP4T RF switch with improved body self-biasing technique in 130-nm SOI CMOS[J]. Journal of Semiconductors, 2020, 41(10): 102404 Copy Citation Text show less

    Abstract

    A single-pole four-throw (SP4T) RF switch with charge-pump-based controller is designed and implemented in a commercial 130-nm silicon-on-insulator (SOI) CMOS process. An improved body self-biasing technique based on diodes is utilized to simplify the controlling circuitry and improve the linearity. A multistack field-effect-transistor (FET) structure with body floating technique is employed to provide good power-handling capability. The proposed design demonstrates a measured input 0.1-dB compression point of 38.5 dBm at 1.9 GHz, an insertion loss of 0.27 dB/0.33 dB and an isolation of 35 dB/27 dB at 900 MHz/1.9 GHz, respectively. The overall chip area is only 0.49 mm2. This RF switch can be used in GSM/WCDMA/LTE front-end modules.
    $ {{P_{{\rm{Watt}}}} = {{10}^{\frac{{35\;{\rm{dBm}}}}{{10}}}} \times 0.001 = 3.16\;{\rm{W,}}} $ (1)

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    $ {{V_{{\rm{peak}}}} = \sqrt {2 {P_{{\rm{Watt}}}} {Z_0}} = 17.8\;{\rm{V,}}} $ (2)

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    $ {{V_{\max }} = {V_{{\rm{peak}}}}\left( {1 + \frac{{\rm{VSWR} - 1}}{{\rm{VSWR} + 1}}} \right) = 28.5\;{\rm{V}}{\rm{.}}} $ (3)

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    $ {R_{\rm{on}}} = M {R_{\rm{FET}}}, $ (4)

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    $ \rm{IL} = {\left| {{S_{21}}} \right|^2} = {\left( {\frac{{2{R_\rm{S}}}}{{{R_{\rm{on}}} + 2{R_{\rm S}}}}} \right)^2}, $ (5)

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    $ \rm{IL} = \frac{{4{R_{\rm S}}^2}}{( 2R_{\rm S} + R_{\rm{on}} )^2 + {\omega ^2}{{\left( {3 + \beta } \right)}^2}C_{\rm{off}}^2{{\left( {{R_{\rm S}} + {R_{\rm{on}}}} \right)}^2}}, $ (6)

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    $ \rm{ISO} = \frac{{4{\omega ^2}C_{\rm{off}}^2R_{\rm{on}}^2R_{\rm{S}}^2}}{{4{{\left( {{R_{\rm{on}}} + \beta {R_{\rm S}}} \right)}^2} + {{\left[ {\beta \left( {\beta + 3} \right){R_{\rm S}} + \left( {\beta + 5} \right){R_{\rm{on}}}} \right]}^2}{\omega ^2}C_{\rm{off}}^2R_{\rm S}^2}}, $ (7)

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    $ {V_{\rm{OUT}}} = - \frac{1}{{C + {C_{\rm{PT}}}}}\left( {C{V_{\rm{DD}}} - kC{V_{\rm{DD}}}{\rm{e}^{\frac{{ - 1}}{{2{R_{\rm{on}}}\left( {C + {C_{\rm{PT}}}} \right)f}}}} - \frac{{{I_{\rm{OUT}}}}}{{2f}}} \right), $ (8)

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    Hao Zhang, Qiangsheng Cui, Xu Yan, Jiahui Shi, Fujiang Lin. A 0.5–3.0 GHz SP4T RF switch with improved body self-biasing technique in 130-nm SOI CMOS[J]. Journal of Semiconductors, 2020, 41(10): 102404
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