Contents
2020
Volume: 41 Issue 2
31 Article(s)

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[in Chinese]
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 1 (2020)
Design and Fabrication of Structure-decoupled Quadruple Mass MEMS Gyroscope
LI Minyang, ZHANG Weiping, GU Liutao, LIU Zhaoyang, and TIAN Mengya
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 177 (2020)
Simulation and Design of Low Voltage Driven F-P Cavity Tunable Filter
REN Haojie, HOU Haigang, ZHU Lihui, and HUANG Qingwei
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 182 (2020)
Optical Fiber Mach-Zehnder Refractive Index Sensor Based on Spindle Air Cavity
DAI Yang, WANG Tingting, SUN Jiacheng, WANG Fei, and HUA Wendong
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 191 (2020)
Surface Plasmon Resonance Fiber Refractive Index Sensor Based on MSM Structure
GUO Zhiyong, GE Yixian, SHEN Lingwen, ZHANG Peng, and GU Qinshun
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 205 (2020)
Preparation of Blue Light GaN-based Micro-LED Chips and Study on Laser Lift-off Process
WANG Xianchi, PAN Zhangxu, LIU Jiucheng, GUO Chan, LI Zhicheng, GONG Yanfen, and GONG Zheng
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 211 (2020)
Study of Defect Perturbation in Reflective Field of EUV Mask Multilayer
LI Guannan, LIU Lituo, ZHOU Weihu, SHI Junkai, and CHEN Xiaomei
Extreme ultraviolet (EUV) lithography system uses a reflective mask structure with multilayers of Mo/Si, but defects can easily occur in the surface of substrate or in the process of depositing multilayer. Even a small defect can cause a large disturbance to the reflected field of mask. Manufacture of defect-free EUV m
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 217 (2020)
Study on The Performance of Vapor Chamber for Near Infrared Single Photon Detector
YAO Youdan, HONG Zhanyong, and LUO Chenggang
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 227 (2020)
Numerical Analysis on Heat Transfer and Flow Characteristics of Grooved Microchannel
FAN Xianguang, HUANG Jiangyao, and XU Yingjie
Four microchannel models with symmetrical and equidistant grooves are proposed for the heat dissipation of electronic devices. The effects of groove shape and layout on microchannel flow and heat transfer performance under different Reynolds numbers (Re) were studied by three-dimensional numerical simulation. The resul
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 232 (2020)
Optimization and Design of Omnidirectional and Broadband Antireflection Layer Based on Moth-eye Array
LIU Xiaoguang, and WANG Yuefeng
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 237 (2020)
Study on Thermal Stability of Ohmic Contact of Pd/NiO/Al/Ni Reflective Electrode on p-GaN
ZUO Bingxin, ZENG Zhaohui, LI Qixin, LI Yelin, LIU Ningyang, ZHAO Wei, CHEN Zhitao, and LI Yunping
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 242 (2020)
Lift-Torque Sensor Applied for Insect-Inspired Flapping-Wing Micro Air Vehicle
MENG Ran, ZHANG Weiping, WANG Chenyang, ZHOU Sui, and WEI Mingchen
Due to high-frequency flapping motion, the insect-inspired flapping-wing micro air vehicles(FMAV)present the characteristics of flexible and large deformation, nonlinearity vibration, force-torque coupling, etc. The lift force and torque generated by IFMAV is about mN and μN·m respectively, but it is difficult to
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 247 (2020)
Preparation and Characterization of Graphene-Molybdenum Disulfide Vertical Heterojunction
GU Jie, YAN Yuankai, and WAN Xi
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 252 (2020)
Research on Distributed Holographic Aperture Digital Imaging Technology Based on GPU
HUANG Jiaying, YANG Feng, ZHU Lei, and RAO Changhui
Distributed holographic aperture digital imaging technology is an active imaging technology that uses digital holography to record the complex amplitude information of each sub-aperture, and realizes comprehensive imaging through phase stitching between apertures. In long-distance imaging, the high-order phase error in
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 257 (2020)
Multispectral Image Preprocessing Based on Elevation and Surface Feature Spectrum Constraints
FANG Xiuxiu, HUANG Min, WANG Dezhi, ZHANG Guifeng, and ZHAO Baowei
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 264 (2020)
Design and Verification of Light and Small Push-broom and Video Integrated Camera
HU Yongfu, XIE Jing, WU Jianfu, QI Wenwen, and MOU Yanna
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 273 (2020)
Research on Feature Detection Algorithm of Fatigue Driving Face Image Based on SVM
LIU Mengjia, and ZHAO Jianguo
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 278 (2020)
Infrared and Visible Image Fusion Based on Two-Level Decision Rules
WANG Fanglian, and LI Xiyan
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 283 (2020)
Design of Automated Test System for Leakage Current between Electrodes of CCD Image Sensor
GUO Li, ZHOU Jianyong, HE Da, HE Changhai, YIN Jun, TANG Zunlie, and YUAN Shishun
Semiconductor Optoelectronics
  • Publication Date: Jan. 01, 1900
  • Vol. 41, Issue 2, 287 (2020)