• Semiconductor Optoelectronics
  • Vol. 41, Issue 2, 169 (2020)
QU Yang1,2, WANG Xinyang1,2,*, ZHOU Quan3, and CHANG Yuchun4
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2020.02.004 Cite this Article
    QU Yang, WANG Xinyang, ZHOU Quan, CHANG Yuchun. Relationship between Voltage of Lateral Anti-blooming Gate and Full Well Capacity in TDI Image Sensor[J]. Semiconductor Optoelectronics, 2020, 41(2): 169 Copy Citation Text show less

    Abstract

    Due to its excellent detection ability under low light illumination, time delay integration CMOS image sensor (TDI-CIS) can be applied in aviation detection and satellite remote sensing. However, it is easy to appear blooming phenomenon to affect observation when TDI-CIS is under higher intensity illumination. In this paper, the mechanism of blooming is introduced firstly and a TDI-CIS with rectangle lateral anti-blooming gate which is arranged in vertical direction based on two different anti-blooming structures is designed. Imaging tests indicate that the voltage of anti-blooming gate (VABG) is negatively corrected with anti-blooming and full well capacity (FWC). Finally, the optimal VABG of 2.1V is obtained.
    QU Yang, WANG Xinyang, ZHOU Quan, CHANG Yuchun. Relationship between Voltage of Lateral Anti-blooming Gate and Full Well Capacity in TDI Image Sensor[J]. Semiconductor Optoelectronics, 2020, 41(2): 169
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