Measurement of the Electron Density of Capacitive-Coupled Plasma by Laser Thomson Scattering

Zeliang Zhang; Haiying Song; Shibing Liu

doi:10.3788/LOP57.231406

Journals >Laser & Optoelectronics Progress >Volume 57 >Issue 23 >Page 231406 > Article

Laser & Optoelectronics Progress
Vol. 57, Issue 23, 231406 (2020)

Measurement of the Electron Density of Capacitive-Coupled Plasma by Laser Thomson Scattering

Zeliang Zhang, Haiying Song^*, and Shibing Liu^*

Author Affiliations

Strong-Field and Ultrafast Photonics Laboratory, Key Laboratory of Trans-Scale Laser Manufacturing Technology, Ministry of Education, Beijing University of Technology, Beijing 100124, China

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DOI: 10.3788/LOP57.231406 Cite this Article Set citation alerts

Zeliang Zhang, Haiying Song, Shibing Liu. Measurement of the Electron Density of Capacitive-Coupled Plasma by Laser Thomson Scattering[J]. Laser & Optoelectronics Progress, 2020, 57(23): 231406 Copy Citation Text

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Zeliang Zhang, Haiying Song, Shibing Liu. Measurement of the Electron Density of Capacitive-Coupled Plasma by Laser Thomson Scattering[J]. Laser & Optoelectronics Progress, 2020, 57(23): 231406

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