• Laser & Optoelectronics Progress
  • Vol. 57, Issue 17, 173401 (2020)
Wanlu Xie, Xiaobin Wu*, Kuibo Wang, Yan Luo, and Yu Wang
Author Affiliations
  • R & D Center of Optoelectronic Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
  • show less
    DOI: 10.3788/LOP57.173401 Cite this Article Set citation alerts
    Wanlu Xie, Xiaobin Wu, Kuibo Wang, Yan Luo, Yu Wang. Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector[J]. Laser & Optoelectronics Progress, 2020, 57(17): 173401 Copy Citation Text show less
    References

    [1] Pirati A, van Schoot J, Troost K et al. The future of EUV lithography: enabling Moore's Law in the next decade[J]. Proceedings of SPIE, 1014, 101430G(2017).

    [2] Obert R W. EUVL: challenges to manufacturing insertion[J]. Journal of Photopolymer Science & Technology, 30, 599-604(2017).

    [3] Levinson H J, Brunner T A. Current challenges and opportunities for EUV lithography[J]. Proceedings of SPIE, 1080, 1080903(2018).

    [4] Li Y Q, Liu Y, Liu L H. Effect of thermal deformation on imaging performance for 16 nm extreme ultraviolet lithography objective[J]. Acta Optica Sinica, 39, 0122001(2019).

    [5] Yu B, Li C, Jin C S et al. Design and fabrication of broadband Mo/Si multilayer films for extreme ultra violet lithography illumination system[J]. Chinese Journal of Lasers, 43, 0407001(2016).

    [6] Liu X L, Li S K, Wang X Z. Simulation model based on equivalent layer method for defective mask multilayer in extremeultra violet lithography[J]. Acta Optica Sinica, 36, 0622005(2015).

    [7] Chen J X, Wang Y, Xie W L. Experimental research on suppression ratio of dynamic gas lock for extreme ultraviolet lithography[J]. Acta Optica Sinica, 37, 0222002(2017).

    [8] Braun S. Foltyn T, van Loyen L, et al. Multi component EUV multilayer mirrors[J]. Proceedings of SPIE, 5037, 274-285(2003).

    [9] Schroder S, Feigl T, Duparré A et al. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates[J]. Optics Express, 15, 13997-14012(2007).

    [10] Feigl T, Yulin S, Benoit N et al. High-temperature LPP collector mirror[J]. Proceedings of SPIE, 6151, 61514A(2006).

    [11] Robichaud J L. SiC optics for EUV, UV, and visible space missions[J]. Proceedings of SPIE, 4854, 39-49(2003).

    [12] Ershov A I, Marx W F et al. EUV source collector[J]. Proceedings of SPIE, 6151, 61513R(2006).

    [13] Claudia E, Johannes L, Holger M et al. -07-04(2013).

    [14] Stefan R, Andreas G, Thomas P, metal mirror, use thereof: US20130057952[P] et al. -03-07(2013).

    [15] Gebhardt A, Risse S, Peschel T et al. New nickel plated metal mirrors utilizing meltspun aluminium silicon alloy[J]. Proceedings of the Euspen International Conference(2009).

    [16] Rohloff R R, Gebhardt A, Schonherr V et al. A novel athermal approach for high-performance cryogenic metal optics[J]. Proceedings of SPIE, 7739, 139-144(2010).

    Wanlu Xie, Xiaobin Wu, Kuibo Wang, Yan Luo, Yu Wang. Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector[J]. Laser & Optoelectronics Progress, 2020, 57(17): 173401
    Download Citation