Researching | Irradiation of Sapphire Under Different Kr+-Ion Beam Parameters

Journals >Laser & Optoelectronics Progress >Volume 56 >Issue 12 >Page 121601 > Article

Laser & Optoelectronics Progress
Vol. 56, Issue 12, 121601 (2019)

Irradiation of Sapphire Under Different Kr ⁺-Ion Beam Parameters

Yuzhao Liu, Zhili Chen^*, Mangmang Fei, Yingxue Xi, and Weiguo Liu

Author Affiliations

College of Information Science and Engineering, Xi'an Technological University, Xi'an, Shaanxi 710032, China

show less

DOI: 10.3788/LOP56.121601 Cite this Article Set citation alerts

Yuzhao Liu, Zhili Chen, Mangmang Fei, Yingxue Xi, Weiguo Liu. Irradiation of Sapphire Under Different Kr ⁺-Ion Beam Parameters [J]. Laser & Optoelectronics Progress, 2019, 56(12): 121601 Copy Citation Text

show less

References

[1] Vishnyakov V, Carter G. Ne +, Ar + and Xe + ion bombardment induced and suppressed topography on Si [J]. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 106, 174-178(1995). http://www.sciencedirect.com/science/article/pii/0168583X95006990

[2] Chan A C T, Wang G C. Roughness evolution of Si(111) by low-energy ion bombardment[J]. Surface Science, 414, 17-25(1998). http://www.sciencedirect.com/science/article/pii/S0039602898004257

[3] Kozhevnikov I V, Peverini L et al. . Roughness evolution of Si surfaces upon Ar ion erosion[J]. Applied Surface Science, 256, 5011-5014(2010). http://www.sciencedirect.com/science/article/pii/S0169433210003363

[4] Frost F, Rauschenbach B. Nanostructuring of solid surfaces by ion-beam erosion[J]. Applied Physics A, 77, 1-9(2003). http://link.springer.com/article/10.1007/s00339-002-2059-3

[5] Ziberi B, Frost F, Tartz M et al. Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion[J]. Thin Solid Films, 459, 106-110(2004). http://www.sciencedirect.com/science/article/pii/S0040609003020546

[6] Ziberi B, Frost F, Höche T et al. Ion-induced self-organized dot and ripple patterns on Si surfaces[J]. Vacuum, 81, 155-159(2006). http://www.sciencedirect.com/science/article/pii/S0042207X06001291

[7] Frost F, Ziberi B, Schindler A et al. Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces[J]. Applied Physics A, 91, 551-559(2008). http://link.springer.com/article/10.1007/s00339-008-4516-0

[8] El-Atwani O, Huynh C, Norris S. Utilizing neon ion microscope for GaSb nanopatterning studies: nanostructure formation and comparison with low energy nanopatterning[J]. Applied Surface Science, 370, 557-564(2016). http://www.sciencedirect.com/science/article/pii/S0169433216302872

[9] Redondo-Cubero A, Galiana B, Lorenz K et al. Self-organised silicide nanodot patterning by medium-energy ion beam sputtering of Si(100): local correlation between the morphology and metal content[J]. Nanotechnology, 27, 444001(2016). http://www.ncbi.nlm.nih.gov/pubmed/27670245

[10] Steeves Lloyd K, Bolotin I L, Schmeling M et al. Metal impurity-assisted formation of nanocone arrays on Si by low energy ion-beam irradiation[J]. Surface Science, 652, 334-343(2016). http://www.sciencedirect.com/science/article/pii/S0039602816300139

[11] Babonneau D, Vandenhecke E, Camelio S. Formation of nanoripples on amorphous alumina thin films during low-energy ion-beam sputtering: experiments and simulations[J]. Physical Review B, 95, 085412(2017). http://journals.aps.org/prb/abstract/10.1103/PhysRevB.95.085412

[12] Liu W G, Xu X H, Chen Z L. The fabrication of self-organized nanostructures[J]. Journal of Xi'an Technological University, 30, 409-415(2010).

[13] Chen Z L, Li R, Liu W G. Morphology and roughness on silicon surface during low energy ion beam erosion[J]. Journal of Xi'an Technological University, 32, 443-446, 450(2012).

[14] Chen Z L, Liu W G. Microstructures and optical properties of crystalline Si surfaces modified by low energy ion beam erosion[J]. Chinese Journal of Vacuum Science and Technology, 33, 826-831(2013).

[15] Chen Z L, Liu W G. Surface topography and optical properties of monocrystalline silicon induced by low energy different ion beam parameters[J]. Infrared and Laser Engineering, 42, 2490-2495(2013).

[16] Chen Z L, Liu W G. Nanodots pattern and optical properties of monocrystalline silicon induced by low energy ion beam[J]. Acta Optica Sinica, 33, 0922003(2013).

[17] Chen Z L, Liu W G, Yang L H. Self-organizing nano-structure and optical properties of sapphire induced by low energy ion beam[J]. Chinese Journal of Lasers, 42, 0306003(2015).

[18] Huang C Q, Xia Y, Chen B et al. Study progress of the manufacturing process of patterned sapphire substrates[J]. Semiconductor Technology, 37, 497-503, 581(2012).

[19] Ren N F, Zhang L, Wang H X et al. Orthogonal experiments and variance analysis in Nd∶YAG pulsed laser trepanning drilling[J]. Laser & Optoelectronics Progress, 54, 061408(2017).

[20] Wang H J, Li Y L, Li P. Orthogonal experiment on laser cutting of AZ31B magnesium aluminum alloys[J]. Laser & Optoelectronics Progress, 55, 101405(2018).

Get PDF(in Chinese)

Figures&Tables (7)

References (20)

Copy Citation Text

Yuzhao Liu, Zhili Chen, Mangmang Fei, Yingxue Xi, Weiguo Liu. Irradiation of Sapphire Under Different Kr ⁺-Ion Beam Parameters [J]. Laser & Optoelectronics Progress, 2019, 56(12): 121601

Download Citation

Set citation alerts for the article

Set citation alerts for the article

Save the article for my favorites

Paper Information

Recommended Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology

Set citation alerts for the article

Please enter your email address