[1] Z. Wang, U. Helmersson, P. O. Kall. Optical properties of anatase TiO2 thin films prepared by aqueous sol-gel process at low temperature［J］. Thin Solid Films, 2002, 405(1-2): 50～54

[2] Y. Sheng, L. Liang, Y. Xu et al.. Low-temperature deposition of the high-performance anatase-titania optical films via a modified sol-gel route［J］. Opt. Mater., 2008, 30(8): 1310～1315

[3] S. T. Sundari, N. C. Raut, T. Mathews et al.. Ellipsometric studies on TiO2 thin films synthesized by spray pyrolysis technique［J］. Appl. Surf. Sci., 2011, 257(17): 7399～7404

[4] Y. Wang, E. Watkins, J. Ilavsky et al.. Water-barrier properties of mixed bis trimethoxysilylpropyl amine and vinyltriacetoxysilane films［J］. J. Phys. Chem. B, 2007, 111(25): 7041～7051

[5] K. A. Ritley, K. P. Just, F. Schreiber et al.. X-ray reflectivity study of solution-deposited ZrO2 thin films on self-assembled monolayers: growth, interface properties, and thermal densification［J］. J. Mater. Res., 2000, 15(12): 2706～2713

[6] Yi Kui, Shao Jianda, Fan Zhengxiu. Effects of roughness on characterization of soft X-ray multilayer coating［J］. Acta Optica Sinica, 1999, 19(6): 800～804

[7] Zhou Yi, Wang Aiying. Determination of optical constants and thickness of diamond-like carbon films by a multiple sample method［J］. Acta Optica Sinica, 2010, 30(8): 2468～2472

[8] R. Swanepoel. Determination of the thickness and optical-constants of amorphous-silicon［J］. J. Phys. E: Sci. Instrum., 1983, 16(12): 1214～1222

[9] Guo Chun, Lin Dawei, Zhang Yundong et al.. Determination of optical constants of LaF3 films from spectrophotometric measurements［J］. Acta Optica Sinica, 2011, 31(7) : 0731001

[10] P. Chrysicopoulou, D. Davazoglou, C. Trapalis et al.. Optical properties of very thin (<100 nm) sol-gel TiO2 films［J］. Thin Solid Films, 1998, 323(1-2): 188～193

[11] I. Chambouleyron, J. M. Martínez, A. C. Moretti et al.. Retrieval of optical constants and thickness of thin films from transmission spectra［J］. Appl. Opt., 1997, 36(31): 8238～8247

[12] A. R. Forouhi, I. Bloomer. Optical dispersion-relations for amorphous semiconductors and amorphous dielectrics［J］. Phys. Rev. B, 1986, 34(10): 7018～7026

[13] A. R. Forouhi, I. Bloomer. Optical-properties of crystalline semiconductors and dielectrics［J］. Phys. Rev. B, 1988, 38(3): 1865～1874

[14] L. G. Parratt. Surface studies of solids by total reflection of X-rays［J］. Phys. Rev., 1954, 95(2): 359～369

[15] S. Phadke, J. D. Sorge, S. Hachtmann et al.. Broad band optical characterization of sol-gel TiO2 thin film microstructure evolution with temperature［J］. Thin Solid Films, 2010, 518(19): 5467～5470

[16] D. Davazoglou. Optical absorption threshold of low pressure chemically vapor deposited silicon oxynitride films from SiCl2H2-NH3-N2O mixtures［J］. Thin Solid Films, 2003, 437(1): 266～271

[17] D. Davazoglou. Optical properties of SnO2 thin films grown by atmospheric pressure chemical vapour deposition oxidizing SnCl4［J］. Thin Solid Films, 1997, 302(1): 204～213

[18] C. L. Mak, B. Lai, K. H. Wong et al.. Spectroellipsometric study of sol-gel derived potassium sodium strontium barium niobate films［J］. J. Appl. Phys., 2001, 89(8): 4491～4496

[19] O. Stenzel. The Physics of Thin Film Optical Spectra: An Introdution ［M］. Berlin: Springer, 2005. 125～140

[20] D. Davazoglou. Determination of optical dispersion and film thickness of semiconducting disordered layers by transmission measurements: application for chemically vapor deposited Si and SnO2 film［J］. Appl. Phys. Lett., 1997, 70(2): 246～248

[21] Shen Weidong, Liu Xu, Zhu Yong et al. Determination of optical constants and thickness of semiconductor thin films by transmission measurement［J］. Chinese J. Semiconductors, 2005, 26(2): 335～340

[22] S. Dourdain, J.-F. Bardeau, M. Colas et al.. Determination by X-ray reflectivity and small angle X-ray scattering of the porous properties of mesoporous silica thin films［J］. Appl. Phys. Lett., 2005, 86(11): 113108

[23] M. J. Henderson, K. Zimny, J. L. Blin et al.. TiO2 thin films self-assembled with a partly fluorinated surfactant template［J］. Langmuir, 2010, 26(2): 1124～1129

[24] S. Vives, C. Meunier. Densification of amorphous sol-gel TiO2 films: an X-ray reflectometry study［J］. Thin Solid Films, 2010, 518(14): 3748～3753

[25] N. Martin, C. Rousselot, D. Rondot et al.. Microstructure modification of amorphous titanium oxide thin films during annealing treatment［J］. Thin Solid Films, 1997, 300(1-2): 113～121

[26] T. Giannakopoulou, N.Todorova, P. Osiceanu et al.. Description of TiO2 thin films treated in NH3 atmosphere by optical dispersion models［J］. Thin Solid Films, 2009, 517(24): 6694～6699

[27] Yu Bo, Li Chun, Jin Chunshui. Diffusion coefficient measurement by grazing incidence X-ray reflection in a Mo/Si multilayer［J］. Chinese J. Lasers, 2011, 38(11): 1107002