[1] Chou S Y, Krauss P R, Zhang W, et al.. Sub-10 nm imprint lithography and applications[J]. Journal of Vacuum Science & Technology B, 1997, 15(6): 2897-2904.
[2] Fang N, Lee H, Sun C, et al.. Sub-diffraction-limited optical imaging with a silver superlens[J]. Science, 2005, 308(5721): 534-537.
[3] Yao Hanming. Optical Projection Micro-Nano Processing Technology[M]. Beijing: Beijing University of Technology, 2006.
[4] Xie Changing, Zhu Xiaoli, Niu Jiebin, et al.. Micro-and nano-metal structures fabrication technology and applications[J]. Acta Optica Sinica, 2011, 31(9): 0900128.
[6] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Theoretical analysis of photolithography alignment and calibration method based on moiré fringes[J]. Acta Optica Sinica, 2012, 32(6): 0607001.
[7] Jiangping Zhu, Song Hu, Junsheng Yu, et al.. Four-quadrant grating moiré fringe alignment measurement in proximity lithography[J]. Opt Express, 2013, 21(3): 3463-3473.
[8] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Calibration method for mask imaging in lithography alignment[J]. Chinese J Lasers, 2013, 40(1): 0108002.
[9] Di Chengliang, Yan Wei, Hu Song, et al.. Moiré-based absolute interferometry with large measurement range in wafer-mask alignment [J]. IEEE Photon Technol Lett, 2014, 27(4): 435-438.
[12] Shaolin Zhou, Yongqi Fu, Xiaoping Tang, et al.. Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography[J]. Opt Express, 2008, 16(11): 7869-7880.
[14] Chen Chen, Liu Ke, Li Yanqiu, et al.. Two-dimensional virtual grating phase shifting moiré fringe method of phase extraction[J]. Chinese J Laser, 2015, 42(2): 0208004.
[15] Shaolin Zhou, Yong Yang, Lixin Zhao, et al.. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography [J]. Opt Lett, 2010, 35(18): 3132-3134.