• Acta Optica Sinica
  • Vol. 36, Issue 1, 105003 (2016)
Si Xinchun1、2、*, Tang Yan1, Hu Song1, Liu Junbo1、2, Cheng Yiguang1、2, Hu Tao1, Zhou Yi1、2, and Deng Qinyuan1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos201636.0105003 Cite this Article Set citation alerts
    Si Xinchun, Tang Yan, Hu Song, Liu Junbo, Cheng Yiguang, Hu Tao, Zhou Yi, Deng Qinyuan. High-Precision Alignment Technique with Large Measurement Range Based on Composite Gratings[J]. Acta Optica Sinica, 2016, 36(1): 105003 Copy Citation Text show less
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    [5] Zhou Shaolin, Yang Yong, Chen Wangfu, et al.. Dual-grating-based nanometer measurement[J]. Acta Optica Sinica, 2009, 29(3): 702- 706.

    [6] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Theoretical analysis of photolithography alignment and calibration method based on moiré fringes[J]. Acta Optica Sinica, 2012, 32(6): 0607001.

    [7] Jiangping Zhu, Song Hu, Junsheng Yu, et al.. Four-quadrant grating moiré fringe alignment measurement in proximity lithography[J]. Opt Express, 2013, 21(3): 3463-3473.

    [8] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Calibration method for mask imaging in lithography alignment[J]. Chinese J Lasers, 2013, 40(1): 0108002.

    [9] Di Chengliang, Yan Wei, Hu Song, et al.. Moiré-based absolute interferometry with large measurement range in wafer-mask alignment [J]. IEEE Photon Technol Lett, 2014, 27(4): 435-438.

    [10] Yue Huimin, Su Xianyu, Li Zeren. Improved fast Fourier transform profilometry based on composite grating[J]. Acta Optica Sinica, 2005, 25(6): 767-771.

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    [12] Shaolin Zhou, Yongqi Fu, Xiaoping Tang, et al.. Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography[J]. Opt Express, 2008, 16(11): 7869-7880.

    [13] Zhang Xiangchun, Song Yaozu. Analysis of measurement accuracy for mini-displacement of moiré fringe by Fourier transform[J]. Acta Optica Sinica, 2003, 23(12): 1445-1450.

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    [15] Shaolin Zhou, Yong Yang, Lixin Zhao, et al.. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography [J]. Opt Lett, 2010, 35(18): 3132-3134.

    CLP Journals

    [1] Du Juyou, Dai Fengzhao, Bu Yang, Wang Xiangzhao. Alignment Technique Using Moire Fringes Based on Self-Coherence in Lithographic Tools[J]. Chinese Journal of Lasers, 2017, 44(12): 1204006

    Si Xinchun, Tang Yan, Hu Song, Liu Junbo, Cheng Yiguang, Hu Tao, Zhou Yi, Deng Qinyuan. High-Precision Alignment Technique with Large Measurement Range Based on Composite Gratings[J]. Acta Optica Sinica, 2016, 36(1): 105003
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