Accuracy in Refractive Index Measurement of As2Se3 Chalcogenide Glass by IR Spectroscopic Ellipsometer

Yang Li; Yongxing Liu; Shixun Dai; Tiefeng Xu; Changgui Lin; Feifei Chen

doi:10.3788/AOS201838.0612002

[1] Ma H, Calvez L, Bureau B et al. Crystallization study of infrared transmitting glass ceramics based on GeS2-Sb2S3-CsClGeS2-Sb2S3-CsCl math container loading mathjax[J]. Journal of Physics & Chemistry of Solids, 68, 968-971(2007).

[2] Moskal D, Martan J, Lang V et al. The stamp method for processing of high noise data from infrared sensor in harsh environment[J]. Sensors & Actuators A Physical, 263, 480-487(2017). http://www.sciencedirect.com/science/article/pii/S0924424717303278

[3] Yue Y, Li L Y, Qi M. Application of multi-target tracking in infrared guidance system[J]. Electronic Measurement Technology, 40, 103-107(2017).

[4] Dai S X, Yu X Y, Zhang W et al. Research progress of chalcogenide glass photonic crystal fibers[J]. Laser & Optoelectronics Progress, 48, 090602(2011).

[5] Astrua M, Pisani M. Validation of a novel technique for the measurement of the refractive index of a prism by means of interlaboratory comparison[J]. Measurement, 42, 1546-1549(2009). http://www.sciencedirect.com/science/article/pii/S0263224109001730

[6] Ji Y J, Du Y J, Guo H Y. Index of refraction of prism using the holoreflecting method[J]. Physical Experiment of College, 23, 23-24(2010).

[7] Mi B Y. Photoelectric automatic refractometer with high precision in the wavelength range 365 to 12000 nm[J]. Optics & Precision Engineering, 6, 79-84(1998).

[8] Ren Q, Chow Y T, Chan H P et al. Refractive index dispersion measurement on nano-crystal and polymer composite Bi4Ti3O12 /PEK-C films[J]. Journal of Materials Science Letters, 21, 677-678(2002).

[9] Yu Z X, Dang M. Generalized simulated annealing algorithm applied in the ellipsometric inversion problem[J]. Thin Solid Films, 425, 108-112(2003). http://www.sciencedirect.com/science/article/pii/S0040609002011343

[11] Pan Y Q, Hang L X, Wu Z S et al. Influence of ion beam post-treatment on surface roughness of TiO2 thin films[J]. Chinese Journal of Lasers, 37, 1108-1113(2010).

[12] Liu W D, Chen C, Zhang H et al. Effect of glass substrate and surface roughness on ellipsometric measurement of silicon nitride films[J]. Chinese Journal of Lasers, 39, 245-248(2012).

[13] Fujiwara H. Spectroscopic ellipsometry: Principles and applications[M]. New York: John Wiley & Sons(2007).

[14] Tikhonravov A V, Tikhonravov A A, Duparré A et al. Effects of interface roughness on the spectral properties of thin films and multilayers[J]. Applied Optics, 42, 5140-5148(2003).

[15] Zhao J M, Yang P. A method for determining ultrathin DLC film thickness by spectroscopic ellipsometry[J]. Microsystem Technologies, 18, 1455-1461(2012).

[16] Wang Q, Shen H, Wang W et al. Ellipsometry by simulated annealing algorithm[J]. Acta Photonica Sinica, 37, 63-65(2008).

[17] Herzinger C M, Johs B, Mcgahan W A et al. Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation[J]. Journal of Applied Physics, 83, 3323-3336(1998).

[18] Kitamura R, Pilon L, Jonasz M. Optical constants of silica glass from extreme ultraviolet to far infrared at near room temperature[J]. Applied Optics, 46, 8118-8133(2007).