[1] M. Lütt, J. P. Schlomka, M. Tolan et al.. Kardar-Parisi-Zhang growth of amorphous silicon on Si/SiO2 ［J］. Phys. Rev. B, 1997, 56(7): 4085～4091

[2] B. Q. Li, I. Kojima, J. M. Zuo. Surface evolution of ultrahigh vacuum magnetron sputter deposited amorphous SiO2 thin films ［J］. J. Appl. Phys., 2002, 91(7): 4082～4089

[3] J. A. Thornton. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings ［J］. J. Vac. Sci. Technol., 1974, 11(4): 666～670

[4] H. Yan. Kinetic growth with surface diffusion: the scaling aspect ［J］. Phys. Rev. Lett., 1992, 68(20): 3048～3051

[5] Z. W. Lai. S. S. Das. Kinetic growth with surface relaxation: continuum versus atomistic models ［J］. Phys. Rev. Lett., 1991, 66(18): 2348～2351

[6] Zhang Fuchun, Zhang Zhiyong, Zhang Weihu et al.. First-principles calculations of electronic structure and optical properties of AZO(ZnOAl)［J］. Acta Optica Sinica, 2009, 29(4): 1025～1031

[7] Chen Chuanxiang, Qi Hongxia. Influence of annealing on ZnO films and ZnO/ p-Si het erojunctions［J］. Acta Optica Sinica, 2008, 28(7): 1411～1414

[8] Y. He, H. Yang, T. Lu et al.. Measurements of dynamic scaling from epitaxial growth front: Fe film on Fe(001) ［J］. Phys. Rev. Lett., 1992, 69(26): 3770～3773

[9] Chen Jiangbo, Wang Li, Su Xueqiong et al.. Affect of ZnO thin film of pulsed laser deposition by substrate temperatures［J］. Chinese J. Lasers, 2009, 36(6): 1539～1544

[10] T. Jiang, N. Hall, A. Ho et al.. Quantitative analysis of electrodeposited tin film morphologies by atomic force microscopy ［J］. Thin Solid Films, 2005, 471(1-2): 76～85

[11] Qi Hongji, Zhang Dongping, Yi Kui et al.. The effect of particle energy on surface morphology of titanium thin films deposited by Ion beam sputtering ［J］. Acta Optica Sinica, 2004, 24(11): 1450～1454

[12] Z. N. Fang, B. Yang, M. G. Chen et al.. Growth and morphology of ultra-thin Al films on liquid substrates studied by atomic force microscopy ［J］. Thin Solid Films, 2009, 517(11): 3408～3411

[13] Li Haiyuan, Tang Yongxing, Hu Lili. Preparation and characterization of ZrO2 thin film by sol-gel method［J］. Chinese J. Lasers, 2009, 36(2): 472～475

[14] Y. C. Liang, H. Y. Lee, Y. C. Liang et al.. Surface evolution and dynamic scaling of heteroepitaxial growth of (La,Ba) MnO3 films on SrTiO3 substrates by rf magnetron sputtering ［J］. Thin Solid Films, 2006, 494(1-2): 196～200

[15] J. H. Xu, L. H. Yu, I. Kojima. Surface evolution of nanostructured CrN and Si3N4 films ［J］. J. Appl. Phys., 2003, 94(10): 6827～6836

[16] H. N. Yang, G. C. Wang. Diffraction from Rough Surface and Dynamic Growth Fronts [M]. Singapore: World Scientific, 1993

[17] J. T. Drotar, Y. P. Zhao, T. M. Lu et al.. Numerical analysis of the noisy Kuramoto-Sivashinsky equation in 2+1 dimensions ［J］. Phys. Rev. E, 1999, 59(1): 177～185

[18] Qi Hongji, Cheng Chuanfu, Yuan Jingmei et al.. Morphology analysis of titanic thin film prepared by ion beam sputtering［J］. Acta Optica Sinica, 2003, 23(4): 480～484