• Chinese Journal of Lasers
  • Vol. 51, Issue 7, 0701005 (2024)
Jing Cao1,2, Wenhe Yang1,2, Zexu Liu1,2, Yunyi Chen1,2..., Xin Wei1,2 and Nan Lin1,2,*|Show fewer author(s)
Author Affiliations
  • 1State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Key Laboratory of Ultra-Intense Laser Science and Technology (CAS), Shanghai 201800, China
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    DOI: 10.3788/CJL231470 Cite this Article Set citation alerts
    Jing Cao, Wenhe Yang, Zexu Liu, Yunyi Chen, Xin Wei, Nan Lin. Controlling Edge Placement Error in Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2024, 51(7): 0701005 Copy Citation Text show less
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    The article is cited by 4 article(s) CLP online library. (Some content might be in Chinese.)
    Jing Cao, Wenhe Yang, Zexu Liu, Yunyi Chen, Xin Wei, Nan Lin. Controlling Edge Placement Error in Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2024, 51(7): 0701005
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