• Laser & Optoelectronics Progress
  • Vol. 47, Issue 4, 41202 (2010)
Wei Haoming1、2、*, Xing Tingwen1, Li Yun1、2, and Liu Zhixiang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop47.041202 Cite this Article Set citation alerts
    Wei Haoming, Xing Tingwen, Li Yun, Liu Zhixiang. Measurement Errors in 632.8 nm High Precision Phase-Shifting Fizeau Interferometer[J]. Laser & Optoelectronics Progress, 2010, 47(4): 41202 Copy Citation Text show less

    Abstract

    To satisfy the need of nanometer measurement for high accuracy optical system,the design of nanometer measurement 632.8 nm phase-shifting Fizeau interferometer is presented. The elementary configuration and measuring principle of the 632.8 nm phase-shifting Fizeau interferometer to measure concave and convex surface are introduced. Some errors that affect the accuracy of interferometer are pointed out,including phase-shifting error,geometrical configuration induced error,vibration error and errors caused by CCD,laser source and fluctuating surroundings. The magnitude of measurement errors is obtained through analysis and simulation,among which phase-shifting error,geometrical configuration induced error,vibration error and fluctuating surroundings have great influence. Finally a group of system parameters and environment paraments for 632.8 nm phase-shifting Fizeau interferometer to realize nanometer measurement are given in theory.
    Wei Haoming, Xing Tingwen, Li Yun, Liu Zhixiang. Measurement Errors in 632.8 nm High Precision Phase-Shifting Fizeau Interferometer[J]. Laser & Optoelectronics Progress, 2010, 47(4): 41202
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