AgGeSbTe thin film as a negative heat-mode resist for dry lithography

Xingwang Chen; Lei Chen; Ying Wang; Tao Wei; Jing Hu; Miao Cheng; Qianqian Liu; Wanfei Li; Yun Ling; Bo Liu

doi:10.3788/COL202220.031601

Journals >Chinese Optics Letters >Volume 20 >Issue 3 >Page 031601 > Article

Chinese Optics Letters
Vol. 20, Issue 3, 031601 (2022)

AgGeSbTe thin film as a negative heat-mode resist for dry lithography

Xingwang Chen¹, Lei Chen¹, Ying Wang¹, Tao Wei^1、2、*, Jing Hu¹, Miao Cheng¹, Qianqian Liu^1、**, Wanfei Li¹, Yun Ling^1、3, and Bo Liu^1、***

Author Affiliations

¹Suzhou Key Laboratory for Nanophotonic and Nanoelectronic Materials and Its Devices, School of Materials Science and Engineering, Suzhou University of Science and Technology, Suzhou 215009, China

²State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China

³School of Electronic & Information Engineering, Suzhou University of Science and Technology, Suzhou 215009, China

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DOI: 10.3788/COL202220.031601 Cite this Article Set citation alerts

Xingwang Chen, Lei Chen, Ying Wang, Tao Wei, Jing Hu, Miao Cheng, Qianqian Liu, Wanfei Li, Yun Ling, Bo Liu. AgGeSbTe thin film as a negative heat-mode resist for dry lithography[J]. Chinese Optics Letters, 2022, 20(3): 031601 Copy Citation Text

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