• Infrared and Laser Engineering
  • Vol. 47, Issue 3, 321004 (2018)
Wang Lishuan1、2、*, Yang Xiao2, Liu Dandan2, Jiang Chenghui2, Liu Huasong1、2, Ji Yiqin1、2, Zhang Feng2, Fan Rongwei1, and Chen Deying1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/irla201847.0321004 Cite this Article
    Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Liu Huasong, Ji Yiqin, Zhang Feng, Fan Rongwei, Chen Deying. Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering[J]. Infrared and Laser Engineering, 2018, 47(3): 321004 Copy Citation Text show less
    References

    [1] Detlev Ristau, Tobias Gross. Ion beam sputter coatings for laser technology[C]//SPIE, 2005, 5963: 596313.

    [2] Yoon S G, Kanga S M, Junga W S, et al. Effect of assist ion beam voltage on intrinsic stress and optical properties of Ta2O5 thin films deposited by dual ion beam sputtering[J]. Thin Solid Films, 2008, 516(11): 3582-3585.

    [3] Demiryont H, Sites J R, Geib K. Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering [J]. Applied Optics, 1985, 24(4):490-495.

    [4] Yoon S G, Kang S M, Yoon D H. Post-annealing effects on the structural properties and residual stress of Ta2O5 thin films deposited by ion beam sputtering [J]. Journal of Optoelectronics & Advanced Materials, 2007, 9(5): 1246-1249.

    [5] Masse J P, Szymanowski H, Zabeida O, et al. Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5, and Nb2O5, films [J]. Thin Solid Films, 2006, 515(4): 1674-1682.

    [6] Chandra S V J, Rao G M, Uthanna S. Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films [J]. Crystal Research & Technology, 2007, 42(3): 290-294.

    [7] Liu Huasong, Jiang Chenghui, Wang Lishuan, et al. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Optics & Precision Engineering, 2014, 22(10): 2645-2651. (in Chinese)

    [8] Ferlauto A S, Ferreira G M, Pearce J M, et al. Analytical model for the optical functions of amorphous semiconductors from the near infrared to ultraviolet: Applications in thin film photovoltaics[J]. Journal of Applied Physics, 2002, 92(5): 2424-2436.

    [9] Liu Huasong, Ji Yiqin, Zhang Feng, et al. Dispersive properties of optical constants of some metallic oxide thin films in the near infrared regions [J]. Acta Optica Sinica, 2014, 34(8): 0831003. (in Chinese)

    [10] Ji Yiqin, Jiang Yugang, Liu Huasong, et al. Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films[J]. Infrared and Laser Engineering, 2013, 42(2): 418-422. (in Chinese)

    [11] Bright T J, Watjen J I, Zhang Z M, et al. Infrared optical properties of amorphous and nanocrystalline Ta2O5 thin films [J]. Journal of Applied Physics, 2013, 114(8): 083515.

    [12] Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, et al. Mechanical characteristics of optical coatings prepared by various techniques: a comparative study.[J]. Applied Optics, 2004, 43(13): 2670-2679.

    Wang Lishuan, Yang Xiao, Liu Dandan, Jiang Chenghui, Liu Huasong, Ji Yiqin, Zhang Feng, Fan Rongwei, Chen Deying. Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering[J]. Infrared and Laser Engineering, 2018, 47(3): 321004
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