Researching

Journals
  • Advanced Photonics
  • Photonics Insights
  • Advanced Photonics Nexus
  • Photonics Research
  • Advanced Imaging
  • View All Journals
  • Chinese Optics Letters
  • High Power Laser Science and Engineering
    • Articles
  • Optics
  • Physics
  • Geography
  • View All Subjects
    • Conferences
  • CIOP
  • HPLSE
  • AP
  • View All Events
    • News
    About CLP
    Search by keywords or author
    Journals >Chinese Optics Letters >Volume 8 >Issue s1 >Page 73 > Article
    • Chinese Optics Letters
    • Vol. 8, Issue s1, 73 (2010)
    Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering
    Stefan Jakobs1, Marc Lappschies1, Uwe Schallenberg1, Olaf Stenzel2, and Steffen Wilbrandt2
    Author Affiliations
  • 1Mso Jena GmbH, Carl-Zeiss-Promenade 10, 07745 Jena, Germany
  • 2Fraunhofer IOF, Albert-Einstein-Stra?e 7, 07745 Jena, Germany
    • show less
    DOI: 10.3788/COL201008s1.0073 Cite this Article Set citation alerts
    Stefan Jakobs, Marc Lappschies, Uwe Schallenberg, Olaf Stenzel, Steffen Wilbrandt. Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering[J]. Chinese Optics Letters, 2010, 8(s1): 73 Copy Citation Text show less
    References

    [1] O. Stenzel S. Wilbrandt, N. Kaiser, M. Vinnichenko, F. Munnik, A. Kolitsch, A. Chuvilin, U. Kaiser, J. Ebert, S. Jakobs, A. Kaless, S. W¨uthrich, O. Treichel, B. Wunderlich, M. Bitzer, and M. Grosel, Thin Solid Films 517, 6058 (2009).

    [2] A. Zoller, S. Bei wenger, R. Gotzelmann, and K. Matl, Proc. SPIE 2253, 394 (1994).

    [3] O. Stenzel, The Physics of Thin Film Optical Spectra: An Introduction (Springer-Verlag, Berlin Heidelberg, 2005).

    [4] S. Wilbrandt, O. Stenzel, N. Kaiser, M. K. Trubetskov, and A. V. Tikhonravov, Appl. Opt. 47, C49 (2008).

    [5] R. Thielsch, A. Gatto, and N. Kaiser, Appl. Opt. 41, 3211 (2002).

    [6] A. Duparre, J. Ferre-Borrull, G. Notni, J. Steinert, and J. M. Bennett, Appl. Opt. 41, 154 (2002).

    Data from CrossRef

    [1] Mark Ziter, Gary Carver, Sarah Locknar, Tim Upton, Bob Johnson. Laser-based assessment of optical interference filters with sharp spectral edges and high optical density. Surface and Coatings Technology, 241, 54(2014).

    [2] Olaf Stenzel. Optical Coatings, 54, 187(2014).

    [3] K?stutis Ju?kevi?ius, Martynas Audronis, Andrius Suba?ius, Simonas Ki?as, Tomas Tolenis, Rytis Buzelis, Ramutis Drazdys, Mindaugas Gaspariūnas, Vitalij Kovalevskij, Allan Matthews, Adrian Leyland. Fabrication of Nb2O5/SiO2 mixed oxides by reactive magnetron co-sputtering. Thin Solid Films, 589, 95(2015).

    [4] J. A. Dobrowolski, Li Li, Michael Jacobson, David W. Allen. 2010 topical meeting on optical interference coatings: manufacturing problem. Applied Optics, 50, C408(2011).

    [5] A. Voronov, S.A. Atarah. Control and broadband monitoring of transparent multilayer thin films deposited by magnetron sputtering. Surface and Coatings Technology, 347, 252(2018).

    [6] J.W. Miller, M. Chesaux, D. Deligiannis, P. Mascher, J.D.B. Bradley. Low-loss GeO2thin films deposited by ion-assisted alternating current reactive sputtering for waveguide applications. Thin Solid Films, 709, 138165(2020).

    [7] Norihiro Sei, Hiroshi Ogawa, Kawakatsu Yamada. Multi-range free-electron laser with a pair of dielectric multilayer mirrors. Applied Physics Letters, 101, 144101(2012).

    [8] Luis V. Rodríguez-de Marcos, Juan I. Larruquert, José A. Méndez, José A. Aznárez. Self-consistent optical constants of SiO_2 and Ta_2O_5 films. Optical Materials Express, 6, 3622(2016).

    [9] Hossein Shahrokhabadi, Majid Vaezzadeh, Alireza Bananej, Mohamad Hadi Maleki. Band gap energy and refractive index dependence of femtosecond laser induced damage threshold in dielectric thin films. Thin Solid Films, 636, 289(2017).

    Abstract
    Get PDF
    References (6)
    Cited By (1)
    Get Citation
    Copy Citation Text
    Stefan Jakobs, Marc Lappschies, Uwe Schallenberg, Olaf Stenzel, Steffen Wilbrandt. Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering[J]. Chinese Optics Letters, 2010, 8(s1): 73
    Download Citation
    Set citation alerts for the article
    Tools
    Share
    Set citation alerts for the article
    Save the article for my favorites
    Paper Information
    Recommended Topics
    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology