Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

Stefan Jakobs; Marc Lappschies; Uwe Schallenberg; Olaf Stenzel; Steffen Wilbrandt

doi:10.3788/COL201008s1.0073

Journals >Chinese Optics Letters >Volume 8 >Issue s1 >Page 73 > Article

Chinese Optics Letters
Vol. 8, Issue s1, 73 (2010)

Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

Stefan Jakobs¹, Marc Lappschies¹, Uwe Schallenberg¹, Olaf Stenzel², and Steffen Wilbrandt²

Author Affiliations

¹Mso Jena GmbH, Carl-Zeiss-Promenade 10, 07745 Jena, Germany

²Fraunhofer IOF, Albert-Einstein-Stra?e 7, 07745 Jena, Germany

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DOI: 10.3788/COL201008s1.0073 Cite this Article Set citation alerts

Stefan Jakobs, Marc Lappschies, Uwe Schallenberg, Olaf Stenzel, Steffen Wilbrandt. Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering[J]. Chinese Optics Letters, 2010, 8(s1): 73 Copy Citation Text

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