[1] Yao Hanmin, Hu Song, Xing Tingwen. Nanofabrication Technology of Optic Projection Exposure[M]. Beijing: Beijing University of Technology Press, 2006. (in Chinese)

[2] Masahiro Watanabe. Focusing and leveling based on wafer surface profile detection with interferometry [C]//SPIE, 1994, 2197: 809-989.

[3] Yan Wei, Li Yanli, Chen Mingyong, et al. Moiré fringe-based focusing-test scheme for optical projection lithography[J]. Acta Optical Sinica, 2011, 31(8): 0805001-1-0805001-5. (in Chinese)

[4] S1 series line scan CCD cameras user manual[Z]. Tianjin: Auto-measurement & Vision Technology Co., Ltd., 2013. (in Chinese)

[5] AIA. Specifications of the camera link interface standard for digital cameras and frame grabbers v2.0 [S]. 2000.

[6] Yang Boxiong. CCD subdivision technology and its application research [D]. Beijing: Institute of Geophysics, China Earthquake Administration, 2005. (in Chinese)

[7] Wu Xiaobo, Zhong Xianxin, Liu Houquan. Improve the resolution of array CCD measurement by polynomial interpolation function [J]. Chinese Journal of Scientific Instrument, 1996, 17(2): 154-159. (in Chinese)

[8] Gu Lin, Hu Xiaodong, Chen Liangyi, et al. Linear CCD sub-piexl edge detection SOC based on FPGA[J]. Acta Photonica Sinica, 2004, 33(5): 617-621. (in Chinese)