Xiuhua FU, Junqi LIU, Zhuolin LI, Haicheng LIU, Haifeng REN, Yibo WANG, Kexu HAN. Study on Thickness Uniformity of Double-sided Sputtering Film on Large-diameter Ultra-thin Substrates[J]. Acta Photonica Sinica, 2023, 52(6): 0631001
- Acta Photonica Sinica
- Vol. 52, Issue 6, 0631001 (2023)
Fig. 1. Schematic diagram of sputtering system
Fig. 2. Magnetic field strength and film thickness distribution
Fig. 3. Magnetic field strength and film thickness distribution
Fig. 4. Test piece motion track
Fig. 5. Comparison of the uniformity of SiO2 and Nb2O5 monolayers with or without metric-spin system
Fig. 6. Schematic of measuring points
Fig. 7. Schematic of base plate clamp and shielding angle
Fig. 8. Uniformity distribution of film thickness of SiO2 and Nb2O5 under different shielding angles
Fig. 9. IR cut filter design curve
Fig. 10. Comparison between the measured spectral curve and the designed curve
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Table 1. Process parameters
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Table 2. Infrared cut filter technical requirements
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