[1] Guo ZHU. Multiscale simulation and experimental study of physical processes involved in magnetron sputtering deposition(2019).
[2] Jinfa TANG, Peifu GU, Xu LIU et al. Modern optical thin film technology(2006).
[3] He YU. Mathematical modeling and experimental study of various sputter deposition and corresponding film properties(2013).
[4] Jianquan SONG, Zhengtang LIU, Zhongqi YU et al. Simulation of thickness distribution of planar magnetron sputtering film. Mechanical Science and Technology, 884-885,794(2001).
[5] Xiangxiu ZHANG, Pengfei ZHANG, Jinzhu ZHAO et al. Effect of substrate motion mode on uniformity of magnetron sputtering rectangular target coating. Vacuum, 53, 1-5(2016).
[6] Chunxue GAO, Zhiwei ZHAO, Xuehua LI. Modeling of thermal stresses in elastic multilayer coating systems. Journal of Applied Physics, 117, 055305(2015).
[7] M SHISHKOV, D POPOV. Thickness uniformity of thin films deposited on a flat substrate by sputtering of a target with rotational symmetry. Vacuum, 42, 1005-1008(1991).
[8] S MAHIEU, G BUYLE, D DEPLA et al. Monte Carlo simulation of the transport of atoms in DC magnetron sputtering. Nuclear Instruments and Methods in Physics Research Section B:Beam Interactions with Materials and Atoms, 243, 313-319(2006).
[9] Xudong TAN, Zi MA, Bangwei CAI. Simulating uniformity of film thickness with finite-elements method. Laser Technology, 27, 480-483(2003).
[10] Jinfa TANG, Quan DENG. Applied thin film optics(1984).
[11] C FU, C YANG, L HAN et al. The thickness uniformity of films deposited by magnetron sputtering with rotation and revolution. Surface and Coatings Technology, 200, 3687-3689(2006).
[12] Lei PAN, Xiaoqiang WANG, Zhong ZHANG et al. Preparation of Mo/Si multilayer film with high uniformity diameter of 120mm by magnetron sputtering. High Power Laser and Particle Beam, 22, 1535-1538(2010).
[13] Z ZHANG, R QI, Y YAO et al. Improving thickness uniformity of Mo/Si multilayers on curved spherical substrates by a masking technique. Coatings, 9, 851(2019).
[14] Boyang WEI, Dongmei LIU, Xiuhua FU et al. Study on film thickness uniformity of magnetron sputtering system based on twin target. Acta Optica Sinica, 41, 0731001(2021).
[15] He YU, Tao WANG, Zhiming WU et al. Study on film deposition uniformity of male-rotation magnetron sputtering coating system. Journal of Vacuum Science and Technology, 30, 149-153(2010).
