[1] Wang Jun, Wang Liping, Jin Chunshui, et al. Extreme ultraviolet lithography objective design based on grouping and graphical user interface［J］. Acta Optica Sinica, 2015, 35(12): 1211001.

[2] Yakshin A E, Nedelcu I, Zoethout E, et al. Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition［C］. Conference on Emerging Lithographic Technologies XI, 2007: I5170.

[3] Yakshin A E, Kozhevnikov I V, Zoethout E, et al. Properties of broadband depth-graded multilayer mirrors for EUV optical systems［J］. Optics Express, 2010, 18(7): 6957-6971.

[4] Qin Juanjuan, Dong Weiwei, Zhou Shu, et al. Recent advances in multilayer coatings for extreme ultraviolet lithography［J］. Chinese Journal of Quantum Electronics, 2014, 31(1): 1-11.

[5] Liang Xinli, Li Yanqiu, Mei Qiuli. Optical design of high-efficiency ripple plate illuminator for EUV lithography［J］. Acta Optica Sinica, 2015, 35(3): 0322005.

[6] Yu Bo, Li Chun, Jin Chunshui, et al. Design and fabrication of broadband Mo/Si multilayer films for extreme ultra violet lithography illumination system［J］. Chinese J Lasers, 2016, 43(4): 0407001.

[7] Spiga D, Mirone A, Pareschi G, et al. Characterization of multilayer stack parameters from X-ray reflectivity data using the PPM program: Measurements and comparison with TEM results［C］. SPIE, 2015, 6266: 626616.

[8] Dane A D, Veldhuis A, Buydens L M C, et al. Application of genetic algorithms for characterization of thin layered materials by glancing incidence X-ray reflectometry［J］. Physica B: Condensed Matter, 1998, 253(3): 254-268.

[9] Rio M S D, Pareschi G. Global optimization and reflectivity data fitting for X-ray multilayer mirrors by means of genetic algorithms［C］. SPIE, 2001, 4145: 88-96.

[10] Deb K, Agrawal R B. Simulated binary crossover for continuous search space［J］. Complex Systems, 2000, 9(3): 115-148.

[11] Wang Xiaoping, Cao Liming. Genetic algorithms: Theory, applications and software implementation［M］. Xi′an: Xi′an Jiaotong University Press, 2002.

[12] Zhou Ming, Sun Shudong. Principle and application of genetic algorithm［M］.Beijing: National Defence Industry Press, 2001.

[13] Zhang Geyang, Li Na, Jin Weidong, et al. A novel quantum genetic algorithm and its application［J］. Electronica Sinica, 2004, 32(3): 476-479.

[14] Wu Nan, Song Fangmin. Quantum computation and quantum computers［J］. Journal of Frontiers of Computer Science and Technology, 2007, 1(1): 1-16.

[15] Gao Hui, Xu Guanghui, Zhang Rui, et al. Real-coded quantum evolutionary algorithm［J］. Control and Decision, 2008, 23(1): 87-90.

[16] Gao Hui, Zhang Rui. Improved real-coded quantum evolutionary algorithms and its application on parameter estimation［J］. Control and Decision, 2011, 26(3): 418-422.

[17] Hey T. Quantum computing: An introduction［J］. Computing and Control Engineering Journal, 1998, 10(3): 105-112.

[18] Zhang G. Quantum-inspired evolutionary algorithms: A survey and empirical study［J］. Journal of Heuristics, 2011, 17(3): 303-351.

[19] Wang Ling. Advances in quantum-inspired evolutionary algorithms［J］. Control and Decision, 2008, 23(12): 1321-1326.

[20] Wang Xia, Wang Xiaodong, Lü Kui. Optimal design of membrane system based on real coded adaptive genetic algorithm［J］. Chinese Journal of Quantum Electronics, 2004, 21(1): 51-55.

[21] Han K H, Kim J H. Quantum-inspired evolutionary algorithm for a class of combinatorial optimization［J］. IEEE Transactions on Evolutionary Computation, 2002, 6(6): 580-593.

[22] Narayanan A, Moore M. Quantum-inspired genetic algorithms［C］. IEEE International Conference on Evolutionary Computation, 1996: 61-66.

[23] Li Min, Dong Ningning, Liu Zhen, et al. Reflectivity measurements of normal-incidence Mo/Si multilayer mirrors at 13.9 and 19.6 nm［J］. Optics and Precision Engineering, 2008, 16(9): 1666-1672.

[24] Modi M H, Lodha G S, Nayak M, et al. Determination of layer structure in Mo/Si multilayers using soft X-ray reflectivity［J］. Physica B: Condensed Matter, 2003, 325(1-4): 272-280.

[25] Aquila A L, Salmassi F, Dollar F, et al. Developments in realistic design for aperiodic Mo/Si multilayer mirrors［J］. Optics Express, 2006, 14(21): 10073-10078.

[26] Yulin S, Feigl T, Kuhlmann T, et al. Interlayer transition zones in Mo/Si superlattices［J］. Journal of Applied Physics, 2002, 92(3): 1216.

[27] Yakshin A E, Louis E, Grts P C, et al. Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry［J］. Physica B: Condensed Matter, 2000, 283(1-3): 143-148.

[28] Kozhevnikov I V, Yakshin A E, Bijkerk F. Wideband multilayer mirrors with minimal layer thicknesses variation［J］. Optics Express, 2015, 23(7): 9276-9283.

[29] Mei Xuefeng, Kuang Shangqi, Xie Yao, et al. Application of the quantum evolutionary algorithm in researches of EUV multilayer［J］. Journal of Changchun University of Science & Technology, 2016, 39(4): 1-7.

[30] Mei Xuefeng. Application of the quantum evolutionary algorithm in researches of EUV multilayer［D］. Changchun: Changchun University of Science and Technology, 2016.

[31] Zhang Lichao. Progress in EUV multilayer coating technologies［J］. Chinese Journal of Optics and Applied Optics, 2010, 3(6): 554-566.

[32] Tan Moyan. Polarized optical elements of extreme ultraviolet and soft X-ray multilayer［D］. Shanghai: Tongji University, 2010.

[33] Henke B L, Gullikson E M, Davis J C. X-ray interactions: Photoabsorption, scattering, transmission, and reflection at E=50-30,000 eV, Z=1-92［J］. Atomic Data and Nuclear Data Tables, 1993, 54(2): 181-342.

[34] Kuhlmann T, Yulin S, Feigl T, et al. Design and fabrication of broadband EUV multilayer mirrors［C］. SPIE, 2002, 4688: 509-515.