Research progress of laser-assisted chemical vapor deposition

Lisha Fan; Fan Liu; Guolong Wu; S. Kovalenko Volodymyr; Jianhua Yao

doi:10.12086/oee.2022.210333

Journals >Opto-Electronic Engineering >Volume 49 >Issue 2 >Page 210333-1 > Article

Opto-Electronic Engineering
Vol. 49, Issue 2, 210333-1 (2022)

Research progress of laser-assisted chemical vapor deposition

Lisha Fan^1、2、3, Fan Liu^1、2、3, Guolong Wu^1、2、3, S. Kovalenko Volodymyr^{1、2、3、4}, and Jianhua Yao^{1、2、3、*}

Author Affiliations

¹Institute of Laser Advanced Manufacturing, Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China

²College of Mechanical Engineering, Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China

³Collaborative Innovation Center of High-End Laser Manufacturing Equipment (National 2011 Plan), Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China

⁴Laser Technology Research Institute, National Technical University of Ukraine, Kiev 03056, Ukraine

show less

DOI: 10.12086/oee.2022.210333 Cite this Article

Lisha Fan, Fan Liu, Guolong Wu, S. Kovalenko Volodymyr, Jianhua Yao. Research progress of laser-assisted chemical vapor deposition[J]. Opto-Electronic Engineering, 2022, 49(2): 210333-1 Copy Citation Text

show less

References

Lisha Fan, Fan Liu, Guolong Wu, S. Kovalenko Volodymyr, Jianhua Yao. Research progress of laser-assisted chemical vapor deposition[J]. Opto-Electronic Engineering, 2022, 49(2): 210333-1

Download Citation

Tools

Save the article for my favorites

Paper Information