[1] H. J. Levinson. Principles of Lithography [M]. Bellingham Washington, SPIE Press, 2001. 1938
[2] Ronse Hurt, Luc Van Den Hove. Resolution enhancement techniques in optical lithography [C]. Semiconductor Fabtech, London, Henley Publishing Trans-world House, 1999: 241~244
[3] M. Noguchi, M. Muraki, Y. Iwasaki et al.. Sub-half micron lithography system with phase shifting effect [ C]. SPIE, 1992, 1674: 92~96
[4] N. Shriraishi, S. Hirukawa, Y. Takeuchi et al.. New imaging technique for 64M-DRAM [C]. SPIE, 1992, 1674: 741~746
[5] J. Finders, A. Engelen, G. Vadenberghe et al.. Experimental evaluation of bulls-eye illumination for assist-free random contact printing at sub-65nm node [C]. SPIE, 2006, 6154: 615~412
[7] J. W. Goodman. Introduction to Foutier Optics[M]. Qin Kecheng Transl. Beijing: Publishing House of Electronics Industry, 2006. 50~53
[8] Y . Zhao, Y. Li, Q. Zhou. Vector iterative algorithm for the design of diffractive optical elements applied to uniform illumination[J]. Opt. Lett., 2004, 29(7): 664~666
[9] R. W. Gerchberg, W. O. Saxton. A practical algorithm for the determination of phase from image and diffraction plane pictures [J]. Optik, 1972, 35(2): 237~246
[10] J. R. Fienup. Iterative method applied to image reconstruction and to computer-generated holograms [J]. Optical Engineering, 1980, 19(3): 297~305
[11] X. G. Deng, Y. P. Li, Y. Qiu et al.. Phase-mixture algorithm applied to design of pure phase elements [J]. Chinese J. Lasers, 1995, B4(5): 447~454
[14] W. Wang, T. Li, Y. P. Li. A hybrid algorithm for the design of DOE in uniform illumination [J]. Opt. Lett., 2000, 181(4-6): 261~265
[15] Zhang Wei, Shu Fangjie, Zhang Xiaobo et al.. Spatial frequency spectrum optimization method for design of diffractive optical elements in uniform illumination [J]. Chinese J. Lasers, 2007, 34(10): 1388~1392