• Journal of Semiconductors
  • Vol. 44, Issue 8, 082802 (2023)
Amgad A. Al-Saman1,2, Eugeny A. Ryndin3, Xinchuan Zhang2, Yi Pei2,*, and Fujiang Lin1,**
Author Affiliations
  • 1School of Microelectronics, University of Science and Technology of China, Hefei 230026, China
  • 2Dynax Semiconductor Inc., Suzhou 215300, China
  • 3Department of Micro- and Nanoelectronics, Saint Petersburg Electrotechnical University, Saint Petersburg 197376, Russia
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    DOI: 10.1088/1674-4926/44/8/082802 Cite this Article
    Amgad A. Al-Saman, Eugeny A. Ryndin, Xinchuan Zhang, Yi Pei, Fujiang Lin. Analytical model of non-uniform charge distribution within the gated region of GaN HEMTs[J]. Journal of Semiconductors, 2023, 44(8): 082802 Copy Citation Text show less
    (Color online) Cross-section of considered GaN/AlGaN HEMT transistor.
    Fig. 1. (Color online) Cross-section of considered GaN/AlGaN HEMT transistor.
    (Color online) The Electron concentration distribution within the gated region of GaN HEMT at Vg = 1 V and swept Vd from 0 to 5 V. In the figure, x denotes the distance along the channel.
    Fig. 2. (Color online) The Electron concentration distribution within the gated region of GaN HEMT at Vg = 1 V and swept Vd from 0 to 5 V. In the figure, x denotes the distance along the channel.
    (Color online) Electron concentration distribution within the gated region of GaN HEMT at Vg = 0 V and swept Vd from 0 to 5 V. In the figure, x denotes the distance along the channel.
    Fig. 3. (Color online) Electron concentration distribution within the gated region of GaN HEMT at Vg = 0 V and swept Vd from 0 to 5 V. In the figure, x denotes the distance along the channel.
    (Color online) Electron concentration distribution within the gated region of GaN HEMT at Vg = –1 V and swept Vd from 0 to 5 V. In figure, x denotes the distance along the channel.
    Fig. 4. (Color online) Electron concentration distribution within the gated region of GaN HEMT at Vg = –1 V and swept Vd from 0 to 5 V. In figure, x denotes the distance along the channel.
    ParameterSymbleValueParameterSymbleValue
    Threshold voltageVoff–2.1 VMobilityµ2000 cm2/(V·s)
    Gate lengthLg0.1 µmSaturation velocityvs2.9 × 105 m/s
    Gate widthWg4 × 30 µmExp. parameterγ12.12 × 10–12
    Barrier thicknessd30 nmExp. parameterγ23.73 × 10–12
    Channel thiknessWch1 µmControlling parametersη1, η20.5 × 10-2
    Substrate thicknessWs100 µmControlling parametera11
    AlGaN dielectric consε10.66 × 10–11 F/mControlling parametera25
    Table 1. Geometrical and simulation parameters of considered GaN/AlGaN HEMT transistor.
    Amgad A. Al-Saman, Eugeny A. Ryndin, Xinchuan Zhang, Yi Pei, Fujiang Lin. Analytical model of non-uniform charge distribution within the gated region of GaN HEMTs[J]. Journal of Semiconductors, 2023, 44(8): 082802
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