Author Affiliations
1College of Intelligent Science and Technology, National University of Defense Technology, Changsha, Hunan 410073, China2Hunan Provincial Key Laboratory of Ultra-Precision Machining Technology, Changsha, Hunan 410073 China3Laboratory of Science and Technology on Integrated Logistics Support, Changsha, Hunan 410073, Chinashow less
Fig. 1. Schematic diagram of ion beam figuring
Fig. 2. Schematic diagram of coordinate transformation in tilted incident ion beam figuring process
Fig. 3. Peak ion beam density varying with the incident angle
Fig. 4. Normalized beam density distribution versus incident angle (0°, 15°, 30°, 45°, 60°)
Fig. 5. Impact curves of the ion beam incident angle. (a) Peak and volumetric removal rates versus the incident angle; (b) figuring accuracy and dwell time versus the incident angle
Fig. 6. Impact of local curvature on the ion sputtering
Fig. 7. Impact of surface gradient on the ion sputtering. (a) Impact of surface gradient on incident angle; (b) secondary sputtering
Fig. 8. Impact of the incident angle on the ion sputtering
Fig. 9. Surface roughness results. (a) Interferometer test results; (b) atomic force microscope test results
Fig. 10. Tilted incident experiments of ion beam. (a) Experimental photo; (b) surface error map
Fig. 11. Surface roughness variation curve. (a) Variation curve with the interferometer test results; (b) variation curve with the atomic force microscope test results
Fig. 12. Surface roughness variation curves with different incident angles
Fig. 13. Process flowchart based on the tilted incident ion beam figuring
Fig. 14. Initial surface accuracy and surface roughness of the single crystal silicon cylindrical mirror. (a) Surface error map; (b) surface roughness results with the interferometer test; (c) surface roughness results with the atomic force microscope test
Fig. 15. Surface accuracy and surface roughness with tilted incident ion beam figuring. (a) Surface error map; (b) surface roughness results with the interferometer test; (c) surface roughness results with the atomic force microscope test
Fig. 16. Surface accuracy and surface roughness with vertical incident ion beam figuring. (a) Surface error map; (b) surface roughness results with the interferometer test; (c) surface roughness results with the atomic force microscope test
Beam voltage /V | Anode current /A | Emission current /mA | Acceleration gate voltage /V | Gas flow under the standard conditions /(mL·min-1) | Mesh size /mm | Incident angle /(°) |
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800 | 0.8 | 30 | 100 | 4 | 30 | 0/15/30/45/60 |
|
Table 1. Process parameters in ion beam figuring process