• Chinese Optics Letters
  • Vol. 12, Issue 9, 092301 (2014)
Hongjuan Huang1, Dawei Yan1, Guosheng Wang2, Feng Xie2, Guofeng Yang1, Shaoqing Xiao1, and Xiaofeng Gu1
Author Affiliations
  • 1Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, Jiangsu, China
  • 2The 38th Research Institute of China Electronics Technology Group Corporation, Hefei 230088, China
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    DOI: 10.3788/col201412.092301 Cite this Article Set citation alerts
    Hongjuan Huang, Dawei Yan, Guosheng Wang, Feng Xie, Guofeng Yang, Shaoqing Xiao, Xiaofeng Gu. GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates[J]. Chinese Optics Letters, 2014, 12(9): 092301 Copy Citation Text show less

    Abstract

    We study the performance of GaN-based p–i–n ultraviolet (UV) photodetectors (PDs) with a 60 nm thin p-type contact layer grown on patterned sapphire substrate (PSS). The PDs on PSS exhibit a low dark current of ~2 pA under a bias of -5 V, a large UV/visible rejection ratio of ~7×103, and a high-quantum efficiency of ~40% at 365 nm under zero bias. The average quantum efficiency of the PDs still remains above 20% in the deep-UV region from 280 to 360 nm. In addition, the noise characteristics of the PDs are also discussed, and the corresponding specific detectivities limited by the thermal noise and the low-frequency 1/f noise are calculated.
    Hongjuan Huang, Dawei Yan, Guosheng Wang, Feng Xie, Guofeng Yang, Shaoqing Xiao, Xiaofeng Gu. GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates[J]. Chinese Optics Letters, 2014, 12(9): 092301
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