Lujie WU, Qingtao WEN, Yazeng GAO, Weier LU, Yang XIA, Yanli LI, Xiangdong KONG, Li HAN. Investigation on the Preparation of High Precision Multilayer X-ray Fresnel Zone Plates Based on Atomic Layer Deposition Technology[J]. Acta Photonica Sinica, 2021, 50(1): 156
- Acta Photonica Sinica
- Vol. 50, Issue 1, 156 (2021)
Fig. 1. Schematic diagrams of the FZP structure and imaging optical path
Fig. 2. The diffraction efficiency calculation of the FZP at the X-ray energy of 8 keV and 15 keV according to coupled wave theory
Fig. 3. Schematic diagram of the source and purging time of Al2O3 and HfO2 films grown by atomic layer deposition
Fig. 4. Schematic diagram of the prepartion structure of the new type of FZP
Fig. 5. Al2O3 and HfO2 thin film thicknesses measured through ellipsometer (0.1 nm)
Fig. 6. SEM and AFM images of the surface morphology of Al2O3 and HfO2 films
Fig. 7. The cross-sectional SEM images of 10 nm Al2O3/HfO2 multilayer film (light gray: Al2O3, dark gray: HfO2) prepared by atomic layer deposition technique
Fig. 8. SEM images of Al2O3/HfO2 multilayer FZP after focused ion beam cutting and polishing
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Table 1. Structural parameters of the FZP with 10 nm outermost zone width at 8 keV
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Table 2. Zone parameters of the FZP with focal distance of 2.564 mm at 8 keV
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