A Novel Real-Time Etching Depth Testing System for Micro-Fabrication

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 17 >Issue 6 >Page 745 > Article

Acta Optica Sinica
Vol. 17, Issue 6, 745 (1997)

A Novel Real-Time Etching Depth Testing System for Micro-Fabrication

[in Chinese]¹, [in Chinese]², [in Chinese]², [in Chinese]², and [in Chinese]²

Author Affiliations

¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Novel Real-Time Etching Depth Testing System for Micro-Fabrication[J]. Acta Optica Sinica, 1997, 17(6): 745 Copy Citation Text

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Abstract

A novel real time system for etching depth measurement is demostrated. The system is not sensitive to instability, temperature variation and gaseous flow. The measurement error is small than 0.98%. We realized the real time test of etching depth in vavuum environment. This has practical significance to binary optics micro fabrication.

Keywords

ion-beam etching binary optics

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Novel Real-Time Etching Depth Testing System for Micro-Fabrication[J]. Acta Optica Sinica, 1997, 17(6): 745

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