• Acta Optica Sinica
  • Vol. 38, Issue 5, 0505001 (2018)
Sen Lu1、2, Kaiming Yang1、*, Yu Zhu1、2, Leijie Wang1、2, and Ming Zhang1、2
Author Affiliations
  • 1 State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
  • 2 Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipment and Control, Tsinghua University, Beijing 100084, China
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    DOI: 10.3788/AOS201838.0505001 Cite this Article Set citation alerts
    Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2018, 38(5): 0505001 Copy Citation Text show less
    References

    [1] Schattenburg M L, Chen C, Everett P N et al. Sub-100 nm metrology using interferometrically produced fiducials[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 17, 2692-2697(1999). http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4970832

    [2] Chen C G, Konkola P T, Heilmann R K et al. Nanometer-accurate grating fabrication with scanning beam interference lithography[C]. SPIE, 4936, 126-134(2002).

    [3] Pati G S, Heilmann R K, Konkola P T et al. Generalized scanning beam interference lithography system for patterning gratings with variable period progressions[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 20, 2617-2621(2002). http://scitation.aip.org/content/avs/journal/jvstb/20/6/10.1116/1.1520563

    [4] Lindau S. The groove profile formation of holographic gratings[J]. Journal of Modern Optics, 29, 1371-1381(1982). http://www.tandfonline.com/doi/abs/10.1080/713820753

    [5] Han J. Bayanheshig, Li W H, et al. Profile evolution of grating masks according to exposure dose and interference fringe contrast in the fabrication of holographic grating[J]. Acta Optica Sinica, 32, 0305001(2012).

    [6] Jewett R. A string model etching algorithm[D]. Berkeley: University of California(1979).

    [7] Zhao J S, Li L F, Wu Z H. Modeling of in-situ monitoring curves during development of holographic gratings[J]. Acta Optica Sinica, 24, 1146-1150(2004).

    [8] Scheckler E W, Tam N N, Pfau A K et al. An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification[J]. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 12, 1345-1356(1993). http://doi.ieeecomputersociety.org/10.1109/43.240082

    [9] Geypen N N. Optimization of resist profiles using resist modeling techniques[D]. Eindhoven: Eindhoven University of Technology(2010).

    [10] Sethian J A[M]. Level set methods and fast marching methods: evolving interfaces in computational geometry, fluid mechanics, computer vision, and materials science(1999).

    [11] Lu S, Yang K M, Zhu Y et al. Interference fringe phase locking system[J]. Optics and Precision Engineering, 25, 1-7(2017).

    [12] Mello B D, da Costa I F, Lima C R et al. . Developed profile of holographically exposed photoresist gratings[J]. Applied Optics, 34, 597-603(1995). http://europepmc.org/abstract/MED/20963156;jsessionid=FBSLkN0SqMQGcXu29hyC.0

    [13] Fan Y, Bourov A, Zavyalova L et al. ILSim: a compact simulation tool for interferometric lithography[C]. SPIE, 5754, 1805-1816(2005).

    [14] Jiang S, Song Y et al. Effect of measured interference fringe period error on groove profile of grating masks in scanning beam interference lithography system[J]. Acta Optica Sinica, 34, 0405003(2014).

    [15] Dill F H, Neureuther A R, Tuttle J A et al. Modeling projection printing of positive photoresists[J]. IEEE Transactions on Electron Devices, 22, 456-464(1975). http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=1477996

    [16] Mack C A. Development of positive photoresists[J]. Journal of the Electrochemical Society, 134, 148-152(1987). http://www.researchgate.net/publication/234940056_Development_of_Positive_Photoresists

    [17] Godunov S K. A difference method for numerical calculation of discontinuous solutions of the equations of hydrodynamics[J]. Matematicheskii Sbornik, 89, 271-306(1959). http://www.ams.org/mathscinet-getitem?mr=119433

    [18] Pati G S, Heilmann R K, Konkola P T et al. Generalized scanning beam interference lithography system for patterning gratings with variable period progressions[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 20, 2617-2621(2002). http://scitation.aip.org/content/avs/journal/jvstb/20/6/10.1116/1.1520563

    [19] Qiu K Q, Liu Z K, Xu X D et al. Standing wave in holographic lithography[J]. Acta Physica Sinica, 61, 014204(2012).

    [20] Pedrotti F L, Pedrotti L S. Introduction to optics[M]. New Jersey: Prentice Hall(1993).

    Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2018, 38(5): 0505001
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