• Acta Optica Sinica
  • Vol. 38, Issue 5, 0505001 (2018)
Sen Lu1、2, Kaiming Yang1、*, Yu Zhu1、2, Leijie Wang1、2, and Ming Zhang1、2
Author Affiliations
  • 1 State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
  • 2 Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipment and Control, Tsinghua University, Beijing 100084, China
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    DOI: 10.3788/AOS201838.0505001 Cite this Article Set citation alerts
    Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2018, 38(5): 0505001 Copy Citation Text show less
    Schematic of SBIL
    Fig. 1. Schematic of SBIL
    Schematic of light wave propagating in photoresist layer
    Fig. 2. Schematic of light wave propagating in photoresist layer
    Normalized exposure within photoresist
    Fig. 3. Normalized exposure within photoresist
    Schematic of FMM
    Fig. 4. Schematic of FMM
    Profile evolution curves under influence of standing wave effect
    Fig. 5. Profile evolution curves under influence of standing wave effect
    Reflectivity versus thickness of ARC
    Fig. 6. Reflectivity versus thickness of ARC
    Profile evolution curves after elimination of standing wave effect
    Fig. 7. Profile evolution curves after elimination of standing wave effect
    ParameterContent
    Wavelength355 nm
    Incident angle45°
    Refractive index of air1.0
    Refractive index of photoresist1.71-0.018i
    Thickness of photoresist400 nm
    Refractive index of ARC1.82-0.34i
    Refractive index of substrate0.883-2.778i
    Table 1. Simulation parameters
    Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Groove Profile Prediction of Grating Masks in Scanning Beam Interference Lithography[J]. Acta Optica Sinica, 2018, 38(5): 0505001
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