• Acta Physica Sinica
  • Vol. 69, Issue 6, 060201-1 (2020)
Wei-Qin Li1、2、*, Zhi-Sheng Huo1, and Hong-Bin Pu1
Author Affiliations
  • 1School of Automation & Information Engineering, Xi’an University of Technology, Xi’an 710048, China
  • 2Department of Electronic Science and Technology, Xi’an Jiaotong University, Xi’an 710049, China
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    DOI: 10.7498/aps.69.20191543 Cite this Article
    Wei-Qin Li, Zhi-Sheng Huo, Hong-Bin Pu. Transient characteristics of electron beam induced current in dielectric and semiconductor sample[J]. Acta Physica Sinica, 2020, 69(6): 060201-1 Copy Citation Text show less
    Schematic of currents generated by the interaction of e-beams with samples.
    Fig. 1. Schematic of currents generated by the interaction of e-beams with samples.
    Schematic diagram of the experimental device.
    Fig. 2. Schematic diagram of the experimental device.
    Simulated (lines) and experimental (squares) results of total electron yield.
    Fig. 3. Simulated (lines) and experimental (squares) results of total electron yield.
    Simulated free charge densities N(t) along the incident direction.
    Fig. 4. Simulated free charge densities N(t) along the incident direction.
    Simulated net space densities (P(t) – N(t)) along the incident direction.
    Fig. 5. Simulated net space densities (P(t) – N(t)) along the incident direction.
    Simulated (a) space potentials V(t) and (b) space fields F(t) along the incident direction.
    Fig. 6. Simulated (a) space potentials V(t) and (b) space fields F(t) along the incident direction.
    Simulated (line) and experimental (squares) effective emission currents II.
    Fig. 7. Simulated (line) and experimental (squares) effective emission currents II.
    (a) Simulated IEBIC and ITE; (b) simulated (line) and experimental (squares) IS.
    Fig. 8. (a) Simulated IEBIC and ITE; (b) simulated (line) and experimental (squares) IS.
    Simulated IEBIC in the steady state under the different values of beam current IB.
    Fig. 9. Simulated IEBIC in the steady state under the different values of beam current IB.
    Simulated ITE as a function of the irradiation time in the different beam energies EB.
    Fig. 10. Simulated ITE as a function of the irradiation time in the different beam energies EB.
    Simulated IEBIC as a function of the irradiation time in the different beam energies EB.
    Fig. 11. Simulated IEBIC as a function of the irradiation time in the different beam energies EB.
    参数SiO2Si
    ρ/g·cm–32.262.32
    $\bar A $/g·mole–12028.1
    $\bar J $/keV 0.1390.173
    $\bar Z $1014
    Table 1.

    Default values of parameters in the scattering process.

    电子散射过程参数默认设置

    束能EB/keV 束流IB/nA 扫描区域/mm2扫描周期/s
    10, 15, 20, 301.61 × 11.2
    Table 2. Default values of parameters.
    参数取值
    束能EB/keV 10
    束流IB/nA 1.6
    体缺陷密度/cm–31017
    界面俘获密度/cm–21014
    Table 3. Default values of parameters.
    Wei-Qin Li, Zhi-Sheng Huo, Hong-Bin Pu. Transient characteristics of electron beam induced current in dielectric and semiconductor sample[J]. Acta Physica Sinica, 2020, 69(6): 060201-1
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